Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly. Nature Communications, 2024; 15 (1) DOI: 10.1038/s41467-024-49839-0 ...

A technical paper titled “Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly” was published by researchers at Tokyo Institute of Technology and Tokyo ...

Aug 29, 2024 New block copolymer enables sub-10nm self-assembly, boosting semiconductor miniaturization (Nanowerk News) Miniaturization is one of the fundamental qualities of modern electronics and is ...