Electron Beam
Power Supplies &
Evaporation Controllers
Ferrotec offers a full range of high quality, state-of-the-art electron beam
evaporation products for the vacuum and thin film industry. These are
developed and manufactured at Ferrotec’s European headquarters in
Germany. This modern facility is DIN EN ISO9001 certified to ensure high
and consistent quality. Ferrotec’s global organization provides sales and
service on a local level, with Ferrotec companies and representative locati-
ons around the world and full sales and service capability in the US.
Ferrotec provides a full range of electron beam evaporation products including
• Single and multihearth evaporators
• High voltage power supplies from 3 kW to 12 kW
• Industry leading programmable control units
• A complete line of vacuum feedthroughs and accessories for installation and
automatic operation.
Electron Beam Products A complete power supply system for electron beam evaporation consists of:
by Ferrotec GmbH • CARRERA High Voltage Power Supply
to accelerate the electrons and to deliver the beam power
• Manufactured at Ferrotec´s European • FPS Filament Power Supply
headquarters with 3 000 m² facility to create the heating current for thermionic emission
• GENIUS Evaporation Controller
• All products, including electronics,
to control all evaporation parameters and to sweep the beam
developed and tested in-house
• Worldwide sales & service network
through Ferrotec companies and repre-
Ferrotec offers competent support through our
sentatives
sales organization and the newly established
• Vacuum laboratory and test center technical electron beam center in Germany.
Training seminars for all Ferrotec products can
• Training facilities
be offered including hands-on practice in our
• DIN EN ISO9001 certified vacuum laboratory.
All electron beam products are thoroughly tested
on test benches and attached to a vacuum
chamber to perform power tests in a real vacu-
um environment.
Ferrotec´s CARRERA series of high voltage power supplies, together
with the GENIUS evaporation controller, is ideally suited for use in
production and R&D evaporation systems. A flexible range of modular
elements allows almost all system configurations to benefit from this
state of the art technology. These range from simple low power, sin-
gle hearth laboratory systems, to complex production systems where
simultaneous high power deposition from up to three multihearth evap-
orators may be required.
Electron Beam
High Voltage Power Supplies
The CARRERA high voltage power supply is
CARRERA 3
extremely compact in size. By incorporating pri-
mary switched technology the power efficiency CARRERA 5/6
of this small unit is as high as 90%. The fast and CARRERA 10/12
tight regulation of the high voltage makes the
CARRERA ideal for harsh conditions of vacuum
applications.
The new modular design allows the CARRERA
to be configured for applications over a wide
power range from 3 kW to 12 kW.
An optional built-in high voltage vacuum relay
enables the unit to select an additional HV out-
put e.g. to drive a glow discharge electrode.
Flexible Interfacing CARRERA
High Voltage Power Supply
The CARRERA power supply incorporates • Output power from 3 kW to 12 kW
a separate interface board which can be
• Sequential or simultaneous supply for up
exchanged with different system configurations.
to three evaporators
For example, a power supply for remote operati-
on also includes the filament-emission regulation • Robust primary switched mode power
and interlock circuit protection on board. The supply
interface can even be designed pin-compatible
• Arc detection within 200 ns and sup-
to exisiting power supplies from other manufac-
pression within 1 µs
turers.
• Full arc recovery within 5 ms
• Controllable arc management system
Arc Management that withstands continuous arcing
• Continuously variable high voltage from
Through a combination of an intelligent arc
2 kV to 10 kV
recognition system and the high switching
frequency of the power unit, arcs are • Up to 4 HV outputs for parallel operation
extinguished extremely fast. This minimizes the
• Switchable HV output for glow discharge
energy that would otherwise continue to feed the
process (optional)
arc. Full power is returned within 3 to 5 ms to
allow the evaporation process to continue. • Compact and lightweight design
The built-in arc management also supports
• CE certified
processes with continuous arcing by either
setting an arc rate threshold or by automatically
switching into a robust recovery mode.
Typical high voltage recovery after an arc
The programmable GENIUS evaporation controller regulates all aspects
of the electron beam deposition process. As well as controlling the high
voltage and regulating the filament supply, the GENIUS also handles the
magnet current supply to the coils of the electron beam evaporator.
Electron Beam
Evaporation Controller
GENIUS
All of the GENIUS functions are accessible from the handheld remote control
GENIUS Pro
which can be used to manually control the evaporation process as well as to set
all process and system parameters.
Access to the menu functions may be limited with three password protected user
levels (e.g. Operator, Standard, Service).
Active pocket and material Active data set
Sweep display
Functionality of GENIUS controller
GENIUS
Evaporation Controller
• Emission control
• Full menu driven programming and
High Emission
control
• High voltage control voltage current
•• Filament
Hand held remote
current control featuring
control
LCD display and joystick control
• Programmable sweep control with
• bipolar
Factorypower
defined beam sweep & control
output
programmes and additional user
• Pocket control for DC and stepper
programmable options
motors
• Compatible with virtually all makes of
• Sequential evaporation control
electron beam evaporator and thick-
ness controller
• Functional interlock circuit protection Menu access / Joysticks for menu Emission current
error acknowledgement and beam control adjustment
•• External
Integrated
I/Ohearth
controlcontrol (optional)
e.g. shutter control
•• Evaporation
RS232, LANdata
and storage
A/D interfaces
•• Monitor
CE certified
for digital I/Os
• Logical I/O addressing
• Master-Slave mode for simultaneous
evaporation
Material Specific Evaporation Parameters
In order to achieve optimum film quality and uniform evaporant utiliza-
tion, the GENIUS can store a wide variety of evaporation parameters
including sweep parameters, high voltage values or safety limits. Up to
99 different data sets can be stored and these may then be applied to
different phases of the process (e.g. material melting and various coating
phases).
Lissajous mode Spiral mode Circle mode with Star mode Dwell matrix mode
sector adaptation and
dynamic defocus
The GENIUS already includes various modes to A unique feature of the GENIUS PRO is the dwell All functions can be accessed from the unique
deflect the electron beam of an evaporator. The matrix functionality. It allows individual energy menu driven GENIUS remote control
GENIUS PRO offers additional beam sweep and control at every position of the crucible. A dwell
defocusing capabilities. For example, by applying time pattern determines the energy distribution
the “spiral” and “circle” patterns, dielectric mate- of the electron beam on the pocket surface and
rials can be more homogenously evaporated. thus the removal of the evaporation material.
Data sets containing evaporation parameters can either be associated to an
individual hearth or stored in memory for external assignment. Utilizing the I/O Pocket Selection
card it is possible to choose a particular data set dependent upon a signal
from a deposition rate controller.
For each data set the following parameters are defined and saved:
Setting of evaporation parameters
• Magnet deflection (position, amplitude, frequency, waveform, beam spot,
limits)
• High voltage
• Safety limits (emission current limit and resolution for automatic operation)
The waveform can be set independently in both X and the Y axis. This
Waveform Editor
enables an oscillation pattern defined by 32 coordinate positions to be estab-
lished. This allows compensation for variations in the energy distribution to
the hearth.
All digital inputs and outputs of the GENIUS controller can be monitored
I/O Monitoring
with the handheld remote control. Internal functions can be linked with
signals from other devices to adapt the operation to the customers needs.
For example the pocket of a ring hearth rotates as soon as high voltage is
applied.
Flexible System Configuration
As a controller for the evaporation system, the GENIUS handles communicati-
on between the CARRERA high voltage power supply and the Filament Power
Supply (FPS). The GENIUS is also compatible with virtually all other electron beam
evaporators and deposition controllers. By using a variety of interface cards
the GENIUS can be configured for integration into different systems. In addition, a
process controller can be set to access all functions of the GENIUS and process
data via the RS232 or an optional LAN interface.
Optional Interface Cards RS232 • Saving and loading of data sets and process parameters
• Evaporation parameter protocolling
• Real time control of evaporation parameters via PC
GRC Gun Rotation Card
• Loading and upgrading of new software / firmware
CPU Card
SMC Stepper Motor Card RS232 Slave • Communication between GENIUS controllers
FSC Filament Switch Card Analog Input • Emission current regulation via an external rate controller (sensitivity adjustable)
LIC LAN Integration Card LIC
Digital • Monitoring of interlocks *
Inputs/Outputs • External selection / monitoring of control functions *
Magnet
Magnet Card • 2-channel bipolar magnet current supply
• Filament power supply interface
Gun Rotation Card • Control and positioning of the hearth assembly *
GRC
• External pocket selection *
• External selection / monitoring of control functions *
SMC
Stepper Motor Control Card • Control and positioning feedback of stepper motors *
Options
Interface Possibilities
Filament Switch Card • Control of a second and third (FSC II) evaporator in sequential mode
FSC
• Remote control via RS232, LAN and/or LAN Integration Card • Provides direct connection of the GENIUS serial port to a computer network
LIC
A/D-interface
GENIUS Interfacing * User Programmable
• Integration of functional interlocks
• LAN integration via ethernet interface
(optional)
• Pin-compatible to all Ferrotec electron
beam products
• Operates with all standard evaporators
by adapting emission-filament current
characteristics
• Works with all standard process and
deposition controllers
• Windows™ visualization available
Sequential Deposition Simultaneous Deposition
A Filament Switch Card (FSC) can be installed For simultaneous evaporation from several elec-
in the GENIUS to enable selection and deposi- tron beam evaporators each source is driven
tion from one of several evaporators within the by a single GENIUS controller. As the emission
vacuum chamber. This configuration requires a current is directly monitored by the filament
dedicated FPS for each evaporator. power supply FPS-X.2, the evaporators can be
powered from a single CARRERA high voltage
power supply.
Specifications
High Voltage Power Supply CARRERA3 CARRERA5 CARRRERA6 CARRERA10 CARRERA12
Max. output power 3 kW 5kW 6kW 10 kW 12 kW
Emission current 0-300 mA 0-500 mA 0-600 mA 0-1000 mA 0-1200 mA
High voltage output 2 - 10 kV
High voltage ripple < ± 0,5 %
High voltage regulation < ± 0,5 %
Coolling forced air
Mains voltage (Europe) 400 VAC, 3Ø, -10%/+6%, 50/60 Hz, 5-wire
Mains voltage (US) 208 VAC, 3Ø, -10%/+6%, 50/60 Hz, 4-wire
Filament Power Supply FPS
Power stage primary switched, 20 kHz
Filament supply 8-50 A @ 10 VAC, 50/60 Hz
Mains voltage 230 VAC, -10%/+6%, 50/60 Hz
Evaporation Controller GENIUS / GENIUS PRO Gun Rotatation Card GRC (optional)
Magnet output Max. No. of pockets 12
x-deflection ± 3 A @ 24 VAC; 0-100 Hz Freely programmable digital inputs 6 optoisolated inputs
y-deflection ± 3 A @ 24 VAC; 0-100 Hz Freely programmable digital outputs 4 relay contacts (500 mA;60 V), 2 trans. outputs
GENIUS sweep modes Sine wave, triangle, square, waveform editor
add. GENIUS PRO sweep modes Circle, spiral, stars, sector adapt., radial speed adj. Stepper Motor Control SMC (optional)
Dwell matrix (8x8), dynamic defocus Power stage for biploar control 500 steps/rev.
Emission input 0-10 V; BNC socket; 12 Bit DAC; sensitivity adj. Max. voltage 24 V
Digital input 6 optoisolated inputs Max. phase current 2,3 A
Digital output 2 relay contacts (500 mA, 60 V)
Serial interface 2 x RS232 (Host, Slave); ASCII-protocol LAN Integration Card LIC (optional)
Storage capacity 99 data sets; 20 material configurations Ethernet BNC = 10 Base2, RJ45 = 10
Max. No. of data sets per process 64 TCP/IP Socket, FTP, Telnet per client and server
Mains voltage 85 - 264 VAC, 50/60 Hz Auxiliary protocols ARP, RARP, PING, RIP
Dimensions (HxWxD); weight Environmental specfications
CARRERA3, CARRERA5/6 175 mm (4U) x 483 mm (19") x 550 mm; 28 kg Ambient temperature 5 - 35° C
CARRERA10/12 350 mm (8U) x 483 mm (19") x 550 mm; 56 kg Humidity < 65 %, non-condensing
FPS 220mm x 220mm x 200mm; 14,5 kg Protective system CARRERA: IP41
GENIUS rack 131 mm (3U) x 483 mm (19") x 300 mm; 10 kg FPS: IP22 (IP53 for HV section)
GENIUS remote control 120 mm x 180 mm x 25 mm; 0,8 kg GENIUS: IP 20
Ordering information
Model Part-Number Model Part-Number
Europe US
CARRERA3 1-44 01 00 1-44 01 05 GENIUS 1-44 08 00
CARRERA5 1-44 02 00 1-44 02 05 GENIUS w. GRC card 1-44 08 10
CARRERA6 1-44 02 50 GENIUS PRO 1-44 09 00
CARRERA10 1-44 03 00 1-44 03 05 GENIUS PRO w. GRC card 1-44 09 10
CARRERA12 1-44 03 50
FPS 3 1-44 07 50 1-44 07 55 Gun Rotation Card GRC 1-44 08 50
FPS 3 (for CF HV Feedthrough) 1-44 06 50 1-44 06 55 Filament Switch Card FSC 1-44 08 51
FPS 3.2 (for simultaneous evaporation) 1-44 07 60 1-44 07 65 Stepper Motor Control SMC 1-44 08 60
FPS 3.2 (for CF HV Feedthrough, sim. evap.) 1-44 06 60 1-44 06 65 LAN Integration Card LIC 1-44 08 70
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www.ferrotec.com
USA (US Headquarters) ITALY
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Nashua, NH 03060 20123 Milano
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www.ferrotec.com
JAPAN (Corporate Headquarters) SPAIN
Ferrotec Corporation Ferrotec (Iberia) S.A.
1 - 4 - 14 Kyobashi C.S.I. “Los Rosales” C/. La Fragua, 1
Chuo-ku, Tokyo 104-0031 28935 Mostoles
P +81-3-3281-8808 P +34 9 16 13 16 53
EB-PS-e 04-2003 © Copyright Ferrotec GmbH 2003, all rights reserved
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www.ferrotec.co.jp
FRANCE
Ferrotec SARL
21, chemin des DARES
01700 Neyron
P +33 4-78-55-16-82
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