Preport
Preport
Seminar Report
(21EC81)
Submitted in partial fulfillment of the requirements for the award of
Bachelor of Engineering
In
Electronics and Communication Engineering
Submitted to
VISVESVARAYA TECHNOLOGICAL UNIVERSITY
Belagavi, Karnataka, 590 014
Submitted by
Preeti C Ukli 2KE21EC069
K. L. E. INSTITUTE OF TECHNOLOGY
Department of Electronics and
Communication Engineering
K. L. E. SOCIETY’S
K. L. E. INSTITUTE OF
TECHNOLOGY, HUBBALLI-
580027
2024-2025
CERTIFICATE
Certified that the seminar entitled “Silicon Photonics” is a bonafide work carried
out by Preeti C Ukli (2KE21EC069), in partial fulfilment for the award of degree
of Bachelor of Engineering in VIII Semester, Electronics and Communication
Engineering of Visvesvaraya Technological University, Belagavi, during the year
2024-25. It is certified that all corrections/suggestions indicated for internal
assessment have been incorporated in the report deposited in the department library.
The seminar report has been approved as it satisfies the academic requirements in
respect of seminar work prescribed for the said degree.
Date: 08-05-2025
I would like to thank our Dean of SWO, Dr. Yerriswamy T. for their
constant encouragement for academic progress.
I would like to thank our Dean of R&D, Dr. Shridhar Mathad. for
their constant encouragement for academic progress.
Finally, I would like to thank all the Technical and Non-Technical staff
of Electronics and Communication department for their valuable help
and support.
ABSTRACT
1. INTRODUCTION 1-11
1.1 MOORE’S LAW AND SILICON TECHNOLOGY 2
1.2 Optical Interconnects 3
1.3 Enter Optoelectronics 5
1.4 Components Of An Optical System 6
2. LITERATURE SURVEY 12-26
2.1 System Design 12
2.2 Methodology 13
2.3 Block Schematic 15
2.4 Description 17
2.5 System Workflow 24
3. CONCEPTS 29-
3.1 How Laser Occur 29
3.2 Raman Effect 30
3.3 Stimulated Raman Scattering & Raman Silicon Laser 31
3.4 Two Photon Absorption & Pin Diode Correction
3.5 Siliconize Photonics
3.5.1 Siliconize Photonics
3.5.2 Silicon Modulator
3.5.3 Encoding the Optical Data
3.5.4 Demodulation
3.5.5 Silicon Interfaces
3.5.6 Silicon Challenges
4. APPLICATIONS 33-36
4.1 Applications of Silicon Photonics 33
4.2 Data Centers and High Speed Communications
4.3 Sensing and Imaging
4.4 Biomedical Applications
4.5 Conclusion
REFERENCE
LIST OF FIGURES
INTRODUCTION
Fiber optic communication is well established today due to the great capacity and reliability it provides. .
Fiber-optic communication is the process of transporting data at high speeds on a glass fiber using light.
However, the technology has suffered from a reputation as an expensive solution. This view is based in large
part on the high cost of the hardware components. These components are typically fabricated using exotic
materials that are expensive to manufacture. In addition, these components tend to be specialized and require
complex steps to assemble and package. These limitations prompted Intel to research the construction of
fiber optic components from other materials, such as silicon. The vision of silicon photonics arose from the
research performed in this area. Its overarching goal is to develop high-volume, low cost optical components
using standard CMOS processing the same manufacturing process used for microprocessors and
semiconductor devices. Silicon presents a unique material for this research because the techniques for
processing it are well understood and it demonstrates certain desirable behaviors. For example, while silicon
is opaque in the visible spectrum, it is transparent at the infrared wavelengths used in optical transmission,
hence it can guide light. Moreover, manufacturing silicon components in high volume to the specifications
needed by optical communication is comparatively inexpensive.
Researchers at Intel have announced advancement in silicon photonics by demonstrating the first continuous
silicon laser based on the Raman Effect. This research breakthrough paves the way for making optical
amplifiers, lasers and wavelength converters to act as light source and also switch a signal’s color in low-
cost silicon. It also brings Intel closer to realizing its vision of “siliconizing” photonics, which will enable
the creation of inexpensive, high-performance optical interconnects in and around PCs, servers and other
devices. There has also been developments which include the achievement of GHz range optical modulator
and detector devices in silicon.
Silicon Photonics Silicon’s key drawback is that it cannot emit laser light, and so the lasers that drive optical
communications have been made of more exotic materials such as indium phosphide and gallium arsenide.
However, silicon can be used to manipulate the light emitted by inexpensive lasers so as to provide light that
has characteristics similar to more-expensive devices. This is just one way in which silicon can lower the
cost of photonics. Intel’s silicon photonics research is an end-to end effort to build integrated photonic
devices in silicon for communication and other applications. To date, Intel has demonstrated laser
production from external light source, tunable filters, optical modulators, photo-detectors and optical
packaging techniques using silicon that can establish optical links with Gbps data rates. Even more is yet to
achieve.
All sequential circuits have one property in common—a well-defined ordering of the switching events must
be imposed if the circuit is to operate correctly. If this were not the case, wrong data might be written into
the memory elements, resulting in a functional failure. The synchronous system approach, in which all
memory elements in the system are simultaneously updated using a globally distributed periodic
synchronization signal (that is, a global clock signal), represents an effective and popular way to enforce this
ordering. Functionality is ensured by imposing some strict constraints on the generation of the clock signals
and their distribution to the memory elements distributed over the chip; non-compliance often leads to
malfunction.
It is an understatement to remark that we live in a world made possible by silicon technology. Modern life
has been shaped and defined by innumerable products that rely on integrated electronic circuits fabricated in
mind-boggling number and precision on silicon wafers. The grand success of silicon technology is not only
the dramatic improvements that have been achieved in performance, but also the exponentially decreasing
per-component manufacturing costs that have kept that performance affordable. In fact, Gordon Moore’s
famous law(1962) describing progress in the semiconductor industry was originally stated in similar
economic terms:
“The complexity for minimum component costs has increased at a rate of roughly a factor of two per
year . . . , this rate can be expected to continue”
Complexity is usually equated to transistor count, and by that measure the exponential progress Department
of Electronics and Communication Engg. Page 2 Silicon Photonics predicted by Moore’s Law has been
maintained through the present day (figure1.1). It has become cheaper over time to pack more and more
transistors into integrated circuits because each individual transistor is continually being made smaller. This
scaling process allows more powerful chips with more transistors to be made for a reasonable price. Smaller
transistors also drive down the price of previous generation chips of any given complexity, because more
functionally identical copies can be simultaneously made on the surface of a silicon wafer for nearly the
same cost. Scaling is the engine of progress in silicon microelectronics. It is sustained only by intensive
research and development in the face of perpetual technology challenges always looming on the horizon.
Goals and benchmarks for scaling are established and monitored in the International Technology Roadmap
for Semiconductors (ITRS), a public document.
In Figure 1.1, transistor counts for integrated circuits showing the historical accuracy of Gordon Moore’s
prediction of exponentially increasing integrated circuit complexity with year by a consortium representing
the global semiconductor industry. The roadmap is intended “to provide a reference of requirements,
potential solutions, and their timing for the semiconductor industry” over a fifteen -year horizon. For many
years, the ITRS has highlighted one threat to continued scaling in particular that must be addressed in the
short term future in order to avoid slowing down the pace of Moore’s Law.
The anticipated problem is often referred to as the “interconnect bottleneck.” As the number of transistors in
an integrated circuit increases, more and more interconnecting wires must be included in the chip to link
those transistors together. Today’s chips already contain well over one kilometer of wiring per square
centimeter of chip area. Sending information along these wires consumes significant power in various losses
and introduces the majority of speed-limiting circuit delay in a modern integrated circuit. Scaling
exacerbates both of these problems by decreasing the cross sectional area of each wire, proportionately
increasing its electrical resistance. With further scaling the RC capacitive charging delays in the wires will
increasingly dominate the overall performance of future integrated circuits. The interconnect bottleneck has
threatened Moore’s Law before. In the late 1990s, integrated circuits contained aluminum wires that were
surrounded by silicon oxide. As interconnect cross sections decreased, mounting circuit delay in capacitive
charging of these aluminum wires began to effect chip performance. A solution was found in a change of
materials. Copper was introduced in place of aluminum, which cut the resistance of the wires nearly in half.
Eventually low dielectric constant (“low-κ”) doped silica infill materials were also phased in to reduce the
capacitance.
In Figure 1.2, according to the ITRS, there is no known manufacturable global or intermediate interconnect
solutions for the 45 nm technology node. In the roadmap, such challenges are highlighted on a spreadsheet in
red, forming the “red brick wall.”
Incorporating these new materials into existing fabrication processes posed Silicon Photonics significant
integration challenges. Copper can diffuse quickly through silicon and create short circuits in the transistors
of a chip unless care is taken to avoid contact between the copper wires and the silicon substrate.
Additionally, the nonexistence of any suitable gas phase etching process for copper requires additive
deposition techniques to be used. The silicon industry invested heavily in research and development to find
diffusion barriers and to perfect “Damascene” deposition processes relying on chemical-mechanical
planarization (CMP). These technologies made copper interconnects possible and have allowed scaling to
continue through the present day.
Further evolutionary progress through materials research in very low-κ dielectrics may postpone the return
of the interconnect bottleneck, but a new approach to information transfer within integrated circuits will
inevitably become necessary if transistors are to continue shrinking into the next decade. According to the
latest update of the ITRS chapter on interconnects, traditional interconnect scaling is not expected to satisfy
performance requirements after approximately 2010 (figure 1.2).
potential benefits of this approach include the virtual elimination of delay, cross talk, and power dissipation
in signal propagation, although significant new challenges will be introduced in signal generation and
detection.
The current integration level of about 1.7 billion transistors is responsible for the high processing capability
of today’s processors. More transistors means more switching power. Since switching decides digital signal
processing power the very high integration of transistors is responsible for the processing power of today’s
processors. But the maximum performance power of systems with these processors is limited by the heat
loss in metal connections, inductive losses due to nearby conductors, proximity effect, i.e. expulsion of
current from inner conductor when conductors are in close proximity, skin effect i.e. concentration of current
flow to the surface of conductor due to its suppression at the interior due to the formation of eddy
currents(loop currents) at the interior whose flux linkage opposes the flux of the main current that caused
them. There are also losses due to metallic imperfections (impurities, lattice mismatch etc.). Due to all these
a speed greater than 10Gbps has never been possible with metal interconnections. Even the core series
processors from Intel has data bus speed around 5Gbps.
The integration density and data rate that can be achieved using conventional electrical interconnects set
very high performance requirements for any optical interconnect system to be viable. We can anticipate that
optical interconnects will make the chip-scale integration of the very best photonic technologies available
today. Stable laser sources, interferometry modulators, dense wavelength division multiplexing (WDM), and
low loss planar waveguides will all be necessary components of an optical interconnect system that can
reach an acceptable per-wire information bandwidth-per-watt figure of merit.
These photonic technologies are now applied primarily in the long-haul telecommuting actions industry,
where individual component cost and size do not drive the market. Data transfer rates and the cost per
transmitted bit through optical fiber networks have improved dramatically in performance over the last few
decades, following exponential progress curves that can compound even faster than Moore’s Law. These
advances underlie the infrastructure of the internet and are responsible for fundamental changes in our lives,
particularly in our experience of distance around the globe. However, while millions of miles of fiber optic
cable now stretch between cities and continents, the photonic components they connect are still typically
packaged separately. Obviously this must change if optical networks are to be replicated in microcosm
within millions of future chips.
Dept. of Electronics and Communication, KLEIT 5
Silicon Photonics 2024-2025
Micro photonics refers to efforts to miniaturize the optical components used in long-distance
telecommunications networks so that integrated photonic circuits can become a reality. Work in this field
spans many subjects, including planar waveguides and photonic crystals, integrated diode detectors,
modulators, and lasers. In more recent years, research focused on the sub wavelength manipulation of light
via metal optics and dispersion engineered effective media has begun to explore the anticipated limits of
scaling in future photonic integrated circuits. Advances in the related and often overlapping field of “nan
photonics” suggest the possibility of eventually controlling optical properties through nano scale
engineering.
Between the long-haul telecommunications industry and research in micro photonics lies a small market that
will undoubtedly aid in driving the integration of on-chip optical networks: high performance
supercomputing. Modern supercomputer performance is typically dominated by the quality of the
interconnecting network that routes information between processor nodes. Consequently, a large body of
research exists on network topology and infrastructure designed to make the most of each photonic
component. This knowledge is ready to be applied to future optical interconnect networks that connect sub
processor cores within a single chip.
If optical interconnects become essential for continued scaling progress in silicon electronics, an enormous
market will open for integrated photonic circuit technology. Eventually, unimagined new products will be
made possible by the widespread availability of affordable, high-density optical systems. Considering the
historical development of computing hardware from the relays and vacuum tubes of early telephone
networks, it is possible that optical interconnects could someday lead to all-optical computers, perhaps
including systems capable of quantum computation.
Unfortunately, there is at present no clear path to practical on-chip optical data transfer and scalable all-
photonic integrated circuits. The obstacles that currently stand in the way of optical interconnects are
challenges for device physics and materials science. Break through are needed that either improve the set of
materials available for micro photonic devices or obviate the need for increased materials performance
through novel device designs.
Fiber optics use light to transmit data over a glass or plastic fiber(silica),and a seed of about 1.7Gbps was
achieved in 1980s itself. Though plastic fibers are also used silica (glass fiber), i.e. Silicon dioxide, that we
use as insulator in CMOS fabrication is most commonly used. The primary benefit of using light rather than
Dept. of Electronics and Communication, KLEIT 6
Silicon Photonics 2024-2025
an electric signal over copper wiring is significantly greater capacity, since data transmission through fibers
is at light speed. But this alone cannot make high speed transmission possible, it also requires the end
devices like modulators, demodulators etc. where conversion between optical and electrical data takes place,
also to work at such high speeds. The Bell Labs in France currently holds the record of transmission with
mixing of about 155 different data streams each on its own light wave and each with a capacity of about
100Gbps that constitute in total a 14Tbps data link using a fiber pair with Dense WDM technology. In
addition, glass fiber has desirable physical properties: it is lighter and impervious to factors such as electrical
interference and crosstalk that degrade signal quality on copper wires. Hence optic fibers can be used even at
places of high lightning with all dielectric cables. The high electrical resistance of fibers makes them usable
even near high tension equipment. Hence repeaters are placed at ranges over 100Kms.
Photonics is the field of study that deals with light, especially the development of components for optical
communications. It is the hardware aspect of fiber optics; and due to commercial demand for bandwidth, it
has enjoyed considerable expansion and developments during the past decade. During the last few years,
researchers at Intel have been actively exploring the use of silicon as the primary basis of photonic
components. This research has established Intel’s reputation in a specialized field called silicon photonics,
which appears poised to provide solutions that break through longstanding limitations of silicon as a material
for fiber optics. In addition to this research, Intel’s expertise in fabricating processors from silicon could
enable it to create inexpensive, high-performance photonic devices that comprise numerous components
integrated on one silicon die.
To understand how optical data might one day travel through silicon in your computer, it helps to know how
it travels over optical fiber today. First, a computer sends regular electrical data to an optical transmitter,
where the signal is converted into pulses of light. The transmitter contains a laser and an electrical driver,
which uses the source data to modulate the laser beam, making beam on and off to generate 1s and 0s.
Imprinted with the data, the beam travels through the glass fiber, encountering switches at various junctures
that route the data to different destinations. If the data must travel more than about 100 kilometers, an optical
amplifier boosts the signal. At the destination, a photo detector reads and converts the data encoded in the
photons back into electrical data. Similar techniques could someday allow us to collapse the dozens of
copper conductors that currently carry data between processors and memory chips into a single photonic
link.
Today’s devices are specialized components made from indium phosphide, lithium notate, and other exotic
materials that can’t be integrated onto silicon chips. That makes their assembly much more complex than the
assembly of ordinary electronics, because the paths that the light travels must be painstakingly aligned to
micrometer precision. In a sense, the photonics industry is where the electronics industry was a half century
ago, before the breakthrough of the integrated circuit.
The only way for photonics to move into the mass market is to introduce integration, high-volume
manufacturing, and low- cost assembly—that is, to “siliconize” photonics. By that we mean integrating
several different optical devices onto one silicon chip, rather than separately assembling each from exotic
materials. In our lab, we have been developing all the photonic devices needed for optical communications,
using the same complementary metal oxide semiconductor (CMOS) manufacturing techniques that the
world’s chip makers now use to fabricate tens of millions of microprocessors and memory chips each year.
A source that can produce narrow coherent beam of light is the prime necessity in optical communication.
Hence lasers are the first choice. However LEDs are also used for some low cost applications. Also for
lasers a 1000 times more power output may be obtained compared to LEDs, based on how we set the gain
medium. However optical communication has limitations due to scattering effects at discontinuities or
imperfections in fiber and also very slight variations in refractive index along the fiber that can affect the
wavelength of signal transmitted. When such limiting factors persist a coherent narrow beam from source,
i.e. a beam of light with each photon at equal lengths along the fiber as well that at a single cross section
showing the same wave properties (frequency, phase, polarization etc.), is a must otherwise the dispersion
and diffraction phenomenon may occur in a different way to each photon in the beam and this can severely
distort or destroy the light signal.
Optical communication operates on the short wave or IR region of EM spectrum (i.e. from 1260-1675nm).
The operating range of wavelength is divided into 6 bands. Among them the C-band (Conventional band),
i.e. from 1530-1565nm is most commonly used, since it has showed the least scattering. Most optical
devices have been developed to work in this range. For communication single mode fibers are preferred,
where mode represents the angles of incidence at the core-cladding interface for which transmission is
possible. Multimode fibers (cross-section diameter>50um) are avoided due to intermodal dispersion, and
Dept. of Electronics and Communication, KLEIT 8
Silicon Photonics 2024-2025
even LEDs can be used. However single mode fibers require high stability for the light source used.
WDM started with mixing of 2 channels and now you can pack dozens of channels of high-speed data onto a
single mode fiber with cross-section as low as 9um,separating the channels by wavelength, a technique
called wavelength-division multiplexing, similar to frequency division multiplexing in radio communication.
Arrayed waveguide grating structures that can perform both mixing and DE multiplexing are used to
implement WDM (Figure 1.3).
In AWG shown in Figure1.3, from 1 to 5, it acts as mux and demux the other way. Regions 2 and 4 are free
space segments and section 3 forms the array of waveguides with a constant length increment. Wherever
light comes out of waveguide to free space, it diffracts, i.e. spreads. A multi wavelength beam coming from
section 1 after diffraction at section 2 passes to each of the waveguides of the array. The phase shift between
the waves coming to section 4 will be such that the waves after diffraction constructive interference of the
composed waves occur where they are received by different waveguides as shown in Figure 1.3. It has the
advantage of integrated planar structure, low cost, low insertion loss and ease of network up gradation, since
with increasing demand for bandwidth instead of laying new fibers, it only requires this device replaced with
a higher capacity structure. As in any optical devices, changes in refractive index with temperature that can
affect wavelength is a problem, and hence precision temperature control within +/-2 degree Celsius is
required.
CHAPTER 2
LITERATURE SURVEY
This section reviews key research and technological advancements related to Silicon Photonics. It highlights
various studies that have contributed to the development of photonic devices using silicon as a core material,
identifies existing gaps, and sets the foundation for the current seminar discussion.
This study, published in Optics Express, focuses on packaging challenges in silicon photonic systems. The
authors address thermal management, optical coupling losses, and mechanical stability as key factors in
commercial deployment. Their work contributed significantly to the development of low-cost, scalable
packaging solutions essential for widespread silicon photonics adoption.
CHAPTER 3
CONCEPTS
Silicon photonics (SiPh) is a material platform from which photonic integrated circuits (PICs) can be
made. Silicon on insulator (SOI) wafers are used as the semiconductor substrate material, and most
of the standard CMOS foundry manufacturing processes can be applied. This compatibility allows
for the cost-effective mass production of silicon photonic devices, making the technology more
accessible and scalable.
SILICONIZE PHOTONICS
To siliconize photonics, we need six basic building blocks:
• An inexpensive light source.
• Devices that route, split, and direct light on the silicon chip.
• A modulator to encode or modulate data into the optical signal.
• A photo detector to convert the optical signal back into electrical bits.
• Low-cost, high-volume assembly methods.
• Supporting electronics for intelligence and photonics contro
Lasers generate a beam of a single wavelength by amplifying light. As shown in (Figure 3.4) electrical or
optical energy is pumped into a gain medium which is surrounded by mirrors to form a “cavity.” Initial
photons are either electrically generated within the cavity or injected into the cavity by an optical pumpm
may be a Light Emitting Diode. As the photons stream through the gain medium, they trigger the release of
duplicate photons from an electron in high energy orbital by disturbing it .The emitted photon will have the
same optical properties (wavelength, phase and polarization), and travelling in the same direction as the
incident photon. This same direction of motion and wave characteristics of every phton that constitute the
laser beam is responsible for the directional narrow beam and coherent properties of the light emitted. As the
photons move back and forth between the mirrors, they gather additional photons. This College of
Engineering, Chengannur Silicon Photonics gain has the effect of amplifying the light. An external chemical,
electrical or optical pump source will be provided to maintain population invertion, i.e the state of electrons
in the gain medium such that more number of electrons will be present in higher energy levels than at low
levels. This is necessary to facilitate continous laser emission to occur. Ultimately, the light is sufficiently
strong to form a “coherent” laser beam in which all the photons stream in parallel at the same wavelength.
This laser beam is shown exiting the cavity by the red beam at the right of the figure below.
The term “laser” is an acronym for Light Amplification through Stimulated Emission of Radiation. The
stimulated emission is created by changing the state of electrons the subatomic particles that make up
electricity. Electrons in conduction band may fall to valence band with the emission of a photon, a process
stimulated by another photon. This generation of photons can be stimulated in many materials, but not in
silicon due to its material properties. Silicon and Germanium are indirect bang gap materials where a
recombination of electron in conduction band with a hole in valence band is least probable or does not occur
at all. It has some momentum consideration as shown in Figure3.3. However there are recombinations that
result in phonon emission(heat) as is seen in ordinary silicon diodes. In case if photonic recombination occur
they are associated with phonon emissions and such large transitions of electron energy that cause this may
Using an external laser source coupled with waveguide has significant problems due to sub-micron
misalignments of laser and fibre and also reflections of laser back to source that result in source instability of
operation and variations in emitted wavelength that will distort the data being transmitted. However, an
alternate process called the Raman effect can be used to amplify light in silicon and other materials, such as
Raman scattering is used today, for example, to boost signals traveling through long stretches of glass fiber.
It allows light energy to be transferred from a strong pump beam into a weaker data beam. Most long-
distance telephone calls today benefit from Raman amplification. Typically, a Raman amplifier requires
kilometers of fiber to produce a useful amount of amplification, because glass exhibits very weak scattering.
Raman amplifier between the two dielectric mirrors, we had the basic configuration needed for a laser. After
all, laser stands for “light amplification by stimulated emission of radiation,” and that’s what was going on in
our device. Photons that entered were multiplied in number by the Raman amplifier. Meanwhile, as the light
waves bounced back and forth between the two mirrors, they stimulated the emission of yet more photons
through Raman scattering. The photons stimulated in this way were in phase with the others in the amplifier,
so the beam generated will be coherent.
In mid-2004, intel discovered that increasing the pump power beyond a certain point failed to increase the
Raman amplification and eventually even reduced it. The culprit was a process called two-photon
absorption, which caused the silicon to absorb a fraction of the pump beam’s photons and release free
electrons. Almost immediately after we turned on the pump laser, a cloud of free electrons built up in the
waveguide, absorbing some of the pump and signal beams and killing the amplification. The stronger the
pump beam, the more electrons created and the more photons lost.
The realization of continous wave all-silicon laser was a challenge due to the existence of two photon
absoption. Intel has achieved a research breakthrough by creating an optical device based on the Raman
effect, enabling silicon to be used for the first time to amplify signals and create continuous beams of laser
light. This breakthrough opens up new possibilities for making optical devices in silicon.Usually, silicon is
transparent to infrared light, meaning atoms do not absorb photons as they pass through the silicon because
the infrared light does not have enough energy to excite an electron. Occasionally, however, two photons
arrive at the atom at the same time in such a way that the combined energy is enough to free an electron
from an atom. Usually, this is a very rare occurrence. However, the higher the pump power, the more
College of
Engineering, Chengannur Silicon Photonics likely it is to happen. Eventually, these free electrons recombine
with the crystal lattice and pose no further problem. However, at high power densities, the rate at which the
free electrons are created exceeds the rate of recombination and they build up in the waveguide.
Unfortunately, these free electrons begin absorbing the light passing through the silicon waveguide and
diminish the power of these signals. The end result is a loss significant enough to cancel out the benefit of
Raman amplification. In 2005, Intel disclosed the development of a way to flush out the extra electrons by
sandwiching the waveguide within a device called a PIN diode; PIN stands for p-type–intrinsic n-type,
where the waveguide forms a part of the intrinsic region of the waveguide. When a reverse voltage is applied
to the PIN structure, the free electrons move toward the diode’s positively charged side; the diode effectively
acts like a vacuum and sweeps the free electrons from the path of the light. This is due to the initial high
electric field that setup across the PIN structure. Using the PIN waveguide, we demonstrated continuous
amplification of a stream of optical bits, more than doubling its original power. Once we had the
amplification, we created the silicon laser by coating the ends of the PIN waveguide with specially designed
mirrors. We make these dielectric mirrors by carefully stacking alternating layers of no conducting
materials, so that the reflected light waves combine and intensify. They can also reflect light at certain
Fundamentally, Intel researchers have demonstrated silicon’s potential as an optical gain material. This
could lead to many applications including optical amplifiers, wavelength converters, and various types of
lasers in silicon.
An example of a silicon optical amplifier (SiOA) using the Raman effect is shown in Figure 1b. Two beams
are coupled into the silicon waveguide. The first is an optical pump, the source of the photons whose energy
will cause the Raman effect. The spectral properties of this pump determine the wavelengths that can be
amplified. As the second beam, which contains the data to be amplified, passes through the waveguide,
energy is transferred from the pump into the signal beam via the Raman effect. The optical data exits the
chip brighter than when it entered; that is, amplified.
Optical amplifiers such as this are most commonly used to strengthen signals that have become weak after
traveling a great distance. Because silicon Raman amplifiers are so compact, they could be integrated
directly alongside other silicon photonic components, with a pump laser attached directly to silicon through
passive alignment. Since any optical device (such as a modulator) introduces losses, an integrated amplifier
could be used to negate these losses. The result could be lossless silicon photonic devices.
The Raman effect could also be used to generate lasers of different wavelengths from a single pump
beam(Figure 3.7). As the pump beam enters the material, the light splits off into different laser cavities with
Dept. of Electronics and Communication, KLEIT 18
Silicon Photonics
mirrors made from integrated silicon filters. Here the resonant wavelength of each cavity exist 2024-2025
and others
cancel by destructive interference during multiple back and forth reflections. The length of the cavity must
be an integral multiple of the wavelength that sustains. The use of lasers at multiple wavelengths is a
common way of sending multiple data streams on a single glass fiber. In such a scenario, Intel’s silicon
components could be used to generate the lasers and to encode the data on each wavelength. The encoding
could be performed by a silicon modulator un veiled by Intel in early 2004. This approach would create an
inexpensive solution for fiber networking that could scale with the data loads of large enterprises.
Optical amplifiers such as this are most commonly used to strengthen signals that have become weak after
traveling a great distance. Because silicon Raman amplifiers are so compact, they could be integrated
directly alongside other silicon photonic components, with a pump laser attached directly to silicon through
passive alignment. Since any optical device (such as amodulator) introduces losses, an integrated amplifier
could be used to negate these losses. The result could be lossless silicon photonic devices.
Beyond building the light source and moving light through the chip, you need a way to modulate the light
beam with data. The simplest option is switching the laser on and off, a technique called direct modulation.
An alternative, called external modulation, is analogous to waving your hand in front of a flashlight beam
blocking the beam of light represents a logical 0; letting it pass represents a 1, without disturbing the source.
The only difference is that in external modulation the beam is always on.(figure 3.8)
Silicon Photonics For data rates of 10 Gbps or higher and traveling distances greater than tens of kilometers,
this difference is critical. Each time a semiconductor laser is turned on, it “chirps” i.e a pulse broadening
occurs due to device heating that result in variation in refractive index. The initial surge of current through
the laser changes its optical properties, causing an undesired shift in wavelength. A similar phenomenon
With an external modulator, by contrast, the laser beam remains stable, continuous, and chirp-free, hence
comparatively a high power source can be used. The light enters the modulator, which shutters the beam
rapidly to produce a data stream; even 10 Gbps data can be sent up to about 100 km with no significant
distortion. Fast modulators are typically made from lithium niobate, which has a strong electro-optic effect
—that is, when an electric field is applied to it, it changes the speed at which light travels through the
material, as a result of variations in refractive index of the material which varies inearly with modulating
voltage applied (Figure 3.9).
A silicon-base modulator, as mentioned before, has the disadvantage of lacking this electro-optic effect. To
get around this drawback, we devised a way to selectively inject charge carriers (electrons or holes) into the
silicon waveguide as the light beam passes through. This used a PIN diode type structure where waveguide
forms the intrinsic region. Because of a phenomenon known as the free carrier plasma dispersion effect, the
accumulated charges change the silicon’s refractive index and thus the speed at which light travels through
it. The silicon modulator splits the beam in two, just like the lithium niobate modulator. However, instead of
the electro-optic effect, it’s the presence or absence of electrons and holes that determines the phases of the
beams and whether they combine to produce a 1 or a 0.The trick is to get those electrons and holes into and
out of the beam’s path fast enough to reach gigahertz data rates. Previous schemes injected the electrons and
holes into the same region of the waveguide. When the power was turned off, the free electrons and holes
faded away very slowly (by lattice recombinations etc.). Hence the maximum speed was limited to about 20
megahertz.
In 2005, Intel disclosed the development of a silicon modulator that uses a transistor like device rather than a
diode both to inject and to remove the charges. Electrons and holes are inserted on opposite sides of an oxide
layer at the heart of the waveguide, where the light is most intense. Unlike ordinary transistors which is a
combination of PN junction diodes connected back to back, here the structure has PIN diodes connected
back to back, where the waveguide on either side of the oxide layer forms the intrinsic regions. Rather than
waiting for the charges to fade away, the transistor structure pulls them out as rapidly as they go in. To date,
this silicon modulator has encoded data at speeds of up to 10 Gbps fast enough to rival conventional optical
communications systems in use today.
3.9 DEMODULATION
Once the beam is flowing through the waveguide, photo detectors are used to collect the photons and
convert them into electrical signals. They can also be used to monitor the optical beam’s properties—power,
Dept. of Electronics and Communication, KLEIT 22
Silicon Photonics
wavelength, and so on—and feed this information back to the transmitter, so that it can optimize2024-2025
the beam.
Silicon absorbs visible light well, which is why it appears opaque to the naked eye.
Infrared Rays, however, passes through silicon without being absorbed, so photons at those wavelengths can
be neither collected nor detected. This problem can be overcome by adding germanium to the silicon
waveguides. Germanium absorbs infrared radiation at longer wavelengths than does silicon, germanium
being a lwer bandgap material than silicon. So using an alloy of silicon and germanium in part of the
waveguide creates a region where infrared photons can be absorbed. Our research shows that silicon
germanium can achieve fast and Silicon Photonics efficient infrared photo detection at 850 nanometers and
1310 nm, the communications wavelengths most commonly used in enterprise networks today.(figure 3.12).
A PIN diode structure in which waveguide forming intrinsic region is used with reverse bias for improved
depletion region width into the intrinsic region. This will enhance the detection since the electron-hole pairs
created at intrinsic region is swept by the electric field in depletion region and forms diode current, and also
the depletion capacitance decreases. However, increased depletion region increases transit time delay and
hence an optimization is necessary.
The detector devices commonly used are the above said PIN diode detector and Avalanche photodiode
detector. InGaAs and germanium are the preferred materials to be used with silicon. In Avalanche
detectors(Figure 3.13) a strong built in electric field exist at the pn junction due to heavy dopping on either
side. This will give an additional advantage of built in amplification.
One step that’s often overlooked in discussions of optical devices is assembly. But this step can account for
as much as a third of the cost of the finished product. Integrating all the devices onto a single chip will help
reduce costs significantly; the fewer discrete devices, the fewer assembly steps required. We’re not yet at the
point of full integration, however, and in the mean time, we still need a way to assemble and connect the
silicon optical devices to external light emitters and optical fibers.
Optical assembly has long been much more challenging than electronics assembly. First, the surfaces where
light enters and exits each component must be polished to near perfection. Each of these mirror like facets
must then be coated to prevent reflections, just as sunglasses are coated to reduce glare. With silicon, some
of these extra assembly steps can be greatly simplified by making them part of the wafer fabrication process.
For example, the ends of the chips can be etched away to a mirror-smooth finish using a procedure known as
deep silicon etching, first developed for making micro electro mechanical systems. This smooth facet can
then be coated with a dielectric layer to produce an antireflective coating. Silicon Photonics Because a fiber
and a waveguide are different sizes, a third device—typically a taper—is needed to connect the two. The
taper acts like a funnel, taking light from a larger optical fiber or laser and feeding it into a smaller silicon
waveguide; it works in the opposite direction as well. Obviously, you don’t want to lose light in the process,
which can be tricky when hooking up a waveguide 1 micrometer across to a 10-µm-diameter optical fiber.
To passively couple a laser to a silicon photonic chip, you start by bonding the laser onto the silicon. Silicon
etching can be used to produce mirrors, to help align the laser beam to the waveguides. You can also etch
posts and stops into the silicon surface, to control the vertical alignment of the laser to the waveguide, and
add lithographic marks, to help with horizontal alignment.
When we lay silicon optic links on silicon chip, it must be optically independent from the rest of the
substrate. For this an interleaving material is used, commonly silica, i.e silicon dioxide which has a
refractive index 1.44 which is less than 3.4 of silicon and hence facilitates light transmission by total internal
reflection.
The various challenges at each stage in the development of silicon photonics, include the difficulty to
develop a continous wave all-silicon laser, GHz range modulator and detector devices etc. However there are
also some other effects seen in silicon that has adverse effect at lower micrometer scale fibre transmissions.
These include Kerr nonlinearity effect and Four wave mixing phenomenon. These are significant, since we
deal with micrometer or nanometer range fibres in silicon photonics. Kerr nonlinearity variation in refractive
index proportional to the square of electric field intensity. When multiplexed waves of different intensities
are transmitted, this will lead to separation of waves and destroy the transmission.
Another phenomenon is the four wave mixing. In case when three photons of different wavelength meet at
an atom or molecule in the fibre, such that one photon will cause an electron excitation, a second photon
brings stimulated transition of excited electron to a lower energy state, again a third photon cause excitation
of the same electron to a much heigher energy state, from where a spontaneous transition to initial actual
energy state of electron occur, with the release of a photon of a fourth different wavelength (Figure 3.14).
CHAPTER 4
The high modulation-demodulation rates along with Dense Wavelength Division Multiplexing with which
Tbps data transmission has been achieved in optical communication, that has never been achieved in any
other forms of communication, is expected to come on computer systems, corporate datacenters and in high
end servers. With the developments in silicon photonics where the electronic and optical components comes
on a single integrated platform, this can be achieved at reduced cost and with the elimination of wired
connections. Routers, signal processors etc. that forms the internet backbone will become more simple and
powerful at low cost. College of Engineering, Chengannur Silicon Photonics Another achievement with
Dept. of Electronics and Communication, KLEIT 26
Silicon Photonics 2024-2025
developments in silicon photonics will be the faster and more compact medical equipments like imaging
machines, lasik surgical instruments etc. There will also be reduction in cost, the same thing that we seen in
electronics industry with the developments in integrated circuits. 3D ICs (Figure 4.1) an emerging
technology. With the developments in silicon photonics there will be developments 3D IC technology which
consist of various layers of electronic and photonic components or circuits. In figure 4.1, a 100-core
processor layer is at the bottom. The communication between cores of the processor and that of the chip with
external devices (off-chip traffic) is handled by a superfast photonic or optical link layer at the top. The
research in this area is going on at the IBM’s research centre.
One of the primary applications of silicon photonics is in data centers and high-speed communications. The
rapid growth of data traffic, driven by the increasing use of cloud services, streaming media, and the Internet
of Things (IoT), has created a need for faster and more efficient data transmission solutions.
Silicon photonic devices, such as transceivers and optical switches, can significantly improve the
performance of data center interconnects by enabling higher data rates, lower latency, and reduced power
consumption compared to traditional electronic devices. For example, silicon photonic transceivers can
support data rates of up to 400 gigabits per second (Gbps) and beyond while consuming less power than
their electronic counterparts.
In high-speed communications, silicon photonics can also be crucial in long-haul telecommunications and
high-performance computing. Its ability to transmit data at high speeds over long distances with minimal
signal loss makes it an attractive option for upgrading existing optical networks and enabling next-
generation communication systems.
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Silicon Photonics 2024-2025
Sensing and Imaging
The technology's ability to manipulate light at the nanoscale opens up new possibilities for creating highly
sensitive and compact sensors for various applications, including environmental monitoring, industrial
process control, and biomedical diagnostics.
In environmental monitoring, these sensors can detect and measure various ecological parameters, such as
temperature, humidity, and gas concentrations. These sensors operate by detecting alterations in these factors
through light interactions. For instance, lidar,which stands for light detection and ranging, is a remote
sensing method that uses light as a pulsed laser to measure variable distances to the Earth. These light
pulses, combined with other data recorded by the airborne system, generate precise, three-dimensional
information about the shape of the Earth and its surface characteristics.
Photonics sensors can monitor industrial process parameters in real-time, such as pressure, flow rate, and
chemical composition. These sensors can offer high sensitivity, fast response times, and resistance to harsh
industrial environments, making them ideal for ensuring process efficiency and safety.
Regarding biomedical diagnostics, silicon photonics can enable the development of lab-on-a-chip devices
that can perform complex biochemical analyses on a single chip. These devices use light interactions with
biological samples to detect and measure various biomarkers, such as proteins, DNA, and cells. For
example, a biosensor might use the change in refractive index caused by the binding of a target biomolecule
to a sensor surface to detect the presence of that biomolecule.
This technology can enable the development of high-resolution, compact, and cost-effective imaging
systems. These systems can leverage these devices' waveguiding and interference properties to manipulate
light in ways that enhance imaging capabilities. For instance, an imaging system might use an array of
Biomedical Applications
Biomedical studies, in general, can get valuable insights by analyzing nanoscale interactions with silicon
photonics. Silicon photonics can be used to develop lab-on-a-chip systems, allowing complex biochemical
analyses on a single chip.
These systems can detect and measure various biomarkers, such as proteins, DNA, and cells, enabling the
rapid and accurate diagnosis of diseases. For instance, a biosensor might use the change in refractive index
In therapeutics, such devices can be used to develop targeted drug delivery systems and photothermal
therapies. For example, nanoparticles can be designed to absorb light at specific wavelengths, generating
heat that can kill cancer cells or trigger the release of drugs. This could enable more effective and less
invasive treatments for cancer-related diseases.
CONCLUSION
Silicon photonics is a transformative technology with great promise for the future of optical communications
and various other applications. By leveraging silicon's unique properties and photonics principles, this
technology can deliver high-speed, energy-efficient, and integrated solutions that can revolutionize
industries such as data centers, artificial intelligence, telecommunications, sensing and imaging, and
biomedical applications. Despite the challenges associated with integration and device fabrication, ongoing
research and development efforts push the boundaries of what is possible, paving the way for a more
connected and data-driven future.
Intel and other industry leaders are working towards creating hybrid platforms by combining silicon with
non-silicon materials, with the future goal of achieving full silicon-based integration. This would not only
reduce production costs but also enable the convergence of photonic and electronic systems on a single chip.
As a result, devices such as servers, high-end PCs, and even everyday gadgets could benefit from ultra-fast
optical communication, making high-speed data transfer more accessible.
With increased research activity, government support, and industrial investment, silicon photonics is steadily
advancing toward commercial viability. The technology promises to transform data centers, cloud
computing, and advanced computing systems, eventually enabling new architectures that were not possible
with traditional electronic components alone. Therefore, silicon photonics is not just an improvement in
communication systems—it is a foundation for the next generation of computing.
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