Scribd
Upload
25 views4 pages

Automated Thin Film Coating System

The ATS 500 is an automated thin film coating system designed for research and small batch production across various industries including semiconductors and organic electronics. It features customizable configurations, a touch-screen interface, and a range of pumping options, accommodating substrate sizes up to 200 mm. The system ensures high uniformity and operator safety, making it suitable for diverse applications such as optical and metal coatings.

Uploaded by

avinashmukherjee143
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
25 views4 pages

Automated Thin Film Coating System

The ATS 500 is an automated thin film coating system designed for research and small batch production across various industries including semiconductors and organic electronics. It features customizable configurations, a touch-screen interface, and a range of pumping options, accommodating substrate sizes up to 200 mm. The system ensures high uniformity and operator safety, making it suitable for diverse applications such as optical and metal coatings.

Uploaded by

avinashmukherjee143
Copyright
© © All Rights Reserved
We take content rights seriously. If you suspect this is your content, claim it here.
Available Formats
Download as PDF, TXT or read online on Scribd
You are on page 1/ 4

ATS 500

Automated Thin Film Coating System

The ATS 500 features a global design that is suitable for research and small batch
production in semiconductors, organic electronics, photovoltaics, optical coatings,
lift-off coatings, and various other metallic and dielectric depositions. The system
comes with a full color, touch-screen interface with integrated process recipe
driven control, and data logging functions. The system is highly flexible and can
be customized with a range of vacuum pumping options, chamber height options
and modular process accessories to suit the specific end-user’s applications.
CHAMBER CONFIGURATIONS

Thermal Evaporat ion Upward Sputtering Downward Sputtering

Electron Beam
Controlled Evaporation Hybrid Configuration
Evaporation

Sample Holder Load Lock


SPECIFICATIONS

CHAMBER SIZE 500 mm x 500 mm (d x h), custom chamber height for lift off

HV PUMPING OPTIONS 400 l/s to 1000 l/s Turbo, 1500 l/s Cryo Pump

PRIMARY PUMPING OPTIONS Rotary/Dry

BASE PRESSURE 10 -7mbar, ATM to 1 x 10 -6 < 40 min

SUBSTRATE SIZE Up to 200 mm diameter

SUBSTRATE HOLDER OPTIONS Rotary, Watercooled, Heated, Bias and Z shift

CONTROL OPTIONS

Touch Screen HMI Operation Touch Screen HMI Operation

Recipe Builder Data Logging

RESULTS

Uniformity of + 5 % as standard. Custom designed configurations to get better than + 3 %.


FE ATURES APPLICAT IONS

- Wide range of processes in a single system - Semiconductors

- Io n beam p rocess for optical co atings - Optical coating s

- Customizable chamber height - Metal coating s

- Accommod ates range of w ork holders - Organic electronics

- Fu l ly interloc ked for operator s afety - Hard coating s

- Compact unit minimizing footprint - Lift-o atings

L AYO UT

All dimensions in mm

Site No. 17, Phase 1, Peenya Industrial Area, Bengaluru 560058,


Karnataka, India. Phone: +91-80-41931000
Email: infotfed@hhvadvancedtech.com
Website: www.hhvadvancedtech.com

Manufacturing Unit:
Site No. 31-34 & 37, Phase1,
KIADB Industrial Area, Dabaspet, Bengaluru Rural 562 111,
Karnataka, India, Phone: +91-80-66703700

You might also like