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"Advanced Self-heating Model and Methodology for Layout Proximity Effect in ..."

Hai Jiang et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9128322

access: closed

type: Conference or Workshop Paper

metadata version: 2021-10-14

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  dblp key:
  - conf/irps/JiangSKSKPUJJKR20
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  - https://dblp.org/rec/conf/irps/JiangSKSKPUJJKR20
Hai Jiang, Hyun-Chul Sagong, Jinju Kim, Hyewon Shim, Yoohwan Kim, Junekyun Park, Taiki Uemura, Yongsung Ji, Taeyoung Jeong, Dongkyun Kwon, Hwasung Rhee, Sangwoo Pae, Brandon Lee:
Advanced Self-heating Model and Methodology for Layout Proximity Effect in FinFET Technology. IRPS 2020: 1-5

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