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"An Intelligent System to Monitor the Chemical Concentration of ..."

Ricky W. K. Leung, Henry C. W. Lau, C. K. Kwong (2004)

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DOI: 10.1023/B:AIRE.0000020937.82267.32

access: closed

type: Journal Article

metadata version: 2019-12-02

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Ricky W. K. Leung, Henry C. W. Lau, C. K. Kwong:
An Intelligent System to Monitor the Chemical Concentration of Electroplating Process: An Integrated OLAP and Fuzzy Logic Approach. Artif. Intell. Rev. 21(2): 139-159 (2004)

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