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"Evaluating nanotribological behavior of annealing ..."

Ming-Jhang Wu et al. (2011)

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DOI: 10.1016/J.MICROREL.2011.06.063

access: closed

type: Journal Article

metadata version: 2020-02-22

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Ming-Jhang Wu, Hua-Chiang Wen, Shyh-Chi Wu, Ping-Feng Yang, Yi-Shao Lai, Wen-Kuang Hsu, Wen-Fa Wu, Chang-Pin Chou:
Evaluating nanotribological behavior of annealing Si_0.8Ge_0.2/Si films. Microelectron. Reliab. 51(12): 2223-2227 (2011)

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