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"Layout decomposition for triple patterning lithography."

Bei Yu et al. (2011)

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DOI: 10.1109/ICCAD.2011.6105297

access: closed

type: Conference or Workshop Paper

metadata version: 2023-03-24

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  - https://dblp.org/rec/conf/iccad/YuYZDP11
Bei Yu, Kun Yuan, Boyang Zhang, Duo Ding, David Z. Pan:
Layout decomposition for triple patterning lithography. ICCAD 2011: 1-8

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