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"Charge trapping and interface states in hydrogen annealed ..."

Y. V. Gomeniuk et al. (2007)

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DOI: 10.1016/J.MICROREL.2007.01.025

access: closed

type: Journal Article

metadata version: 2020-02-22

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Y. V. Gomeniuk, A. N. Nazarov, Ya. N. Vovk, V. S. Lysenko, Yi Lu, Octavian Buiu, Steve Hall, R. J. Potter, Paul R. Chalker:
Charge trapping and interface states in hydrogen annealed HfO₂-Si structures. Microelectron. Reliab. 47(4-5): 714-717 (2007)

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