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"Effects of electrical stress on mid-gap interface trap density and capture ..."

Hyuck In Kwon et al. (2004)

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DOI: 10.1016/S0026-2714(03)00161-6

access: closed

type: Journal Article

metadata version: 2020-02-22

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  - https://dblp.org/rec/journals/mr/KwonKPLPAL04
Hyuck In Kwon, In Man Kang, Byung-Gook Park, Jong Duk Lee, Sang Sik Park, Jung Chak Ahn, Yong Hee Lee:
Effects of electrical stress on mid-gap interface trap density and capture cross sections in n-MOSFETs characterized by pulsed interface probing measurements. Microelectron. Reliab. 44(1): 47-51 (2004)

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