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"Effect of nitridation on the reliability of thick gate oxides."
C.-T. Wu et al. (2003)
- C.-T. Wu, A. Mieckowski, R. S. Ridley, G. Dolny, T. Grebs, J. Linn, Jerzy Ruzyllo:
Effect of nitridation on the reliability of thick gate oxides. Microelectron. Reliab. 43(1): 43-47 (2003)
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