I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration - Romain Ritzenthaler; Tom Schram; M. J. Cho; Anda Mocuta; Naoto Horiguchi; Aaron Voon-Yew Thean; Alessio Spessot; Christian Caillat; Marc Aoulaiche; Pierre Fazan; K. B. Noh; Y. Son (2015 International Conference on IC Design & Technology, ICICDT 2015, Leuven, Belgium, June 1-3, 2015, 2015)

Assessment of SiGe quantum well transistors for DRAM peripheral applications - Romain Ritzenthaler; Tom Schram; Geert Eneman; Anda Mocuta; Naoto Horiguchi; Aaron Voon-Yew Thean; Alessio Spessot; Marc Aoulaiche; Pierre Fazan; K. B. Noh; Y. Son (2015 International Conference on IC Design & Technology, ICICDT 2015, Leuven, Belgium, June 1-3, 2015, 2015)

Impact of Al2O3 position on performances and reliability in high-k metal gated DRAM periphery transistors - Marc Aoulaiche; Eddy Simoen; Romain Ritzenthaler; Tom Schram; Hiroaki Arimura; Moonju Cho; Thomas Kauerauf; Guido Groeseneken; Naoto Horiguchi; Aaron Thean; Antonio Federico; Felice Crupi; et al. (Proceedings of the European Solid-State Device Research Conference, ESSDERC 2013, Bucharest, Romania, September 16-20, 2013, 2013)