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"Spatio-Temporal Defect Generation Process in Irradiated HfO2 MOS Stacks: ..."

Fernando Leonel Aguirre et al. (2019)

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DOI: 10.1109/IRPS.2019.8720539

access: closed

type: Conference or Workshop Paper

metadata version: 2024-02-05

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  dblp key:
  - conf/irps/AguirrePRRVMPDR19
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  - https://dblp.org/rec/conf/irps/AguirrePRRVMPDR19
Fernando Leonel Aguirre, Andrea Padovani, Alok Ranjan, Nagarajan Raghavan, Nahuel Vega, Nahuel Muller, Sebastián Matías Pazos, Mario Debray, Joel Molina Reyes, Kin Leong Pey, Felix Palumbo:
Spatio-Temporal Defect Generation Process in Irradiated HfO2 MOS Stacks: Correlated Versus Uncorrelated Mechanisms. IRPS 2019: 1-8

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