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"Hybrid HCI Degradation in Sub-micron NMOSFET due to Mixed Back-end Process ..."

Kuilong Yu et al. (2020)

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DOI: 10.1109/IRPS45951.2020.9129336

access: closed

type: Conference or Workshop Paper

metadata version: 2020-07-30

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  dblp key:
  - conf/irps/YuZFMHX20
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  - https://dblp.org/rec/conf/irps/YuZFMHX20
Kuilong Yu, Xiaojuan Zhu, Rui Fang, Tingting Ma, Kun Han, Zhongyi Xia:
Hybrid HCI Degradation in Sub-micron NMOSFET due to Mixed Back-end Process Damages. IRPS 2020: 1-4

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