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"Physical and electrical characteristics of the high-k ..."

Chyuan Haur Kao et al. (2010)

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DOI: 10.1016/J.MICROREL.2010.02.005

access: closed

type: Journal Article

metadata version: 2020-02-22

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Chyuan Haur Kao, T. C. Chan, Kung Shao Chen, Yu-Teng Chung, Wen-Shih Luo:
Physical and electrical characteristics of the high-k Nd₂O₃ polyoxide deposited on polycrystalline silicon. Microelectron. Reliab. 50(5): 709-712 (2010)

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