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"Comparison of low-temperature electrical characteristics of ..."

Kiichi Tachi et al. (2011)

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DOI: 10.1016/J.MICROREL.2011.01.004

access: closed

type: Journal Article

metadata version: 2024-03-24

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  - https://dblp.org/rec/journals/mr/TachiBKICE11
Kiichi Tachi, Sylvain Barraud, Kuniyuki Kakushima, Hiroshi Iwai, Sorin Cristoloveanu, Thomas Ernst:
Comparison of low-temperature electrical characteristics of gate-all-around nanowire FETs, Fin FETs and fully-depleted SOI FETs. Microelectron. Reliab. 51(5): 885-888 (2011)

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