Extreme ultraviolet (EUV) lithography plays a vital role in the advanced technology nodes of
integrated circuits manufacturing. Source mask optimization (SMO) is a critical resolution …

Vortex identification and visualization are important for understanding the underlying
physical mechanism of the flow field and have been intensively studied recently. Local vortex …

Source mask optimization (SMO) is one of the indispensable resolution enhancement techniques
to guarantee the image fidelity and process robustness for the 2Xnm technology node …

Decision trees have been widely used for online learning classification. Many approaches
usually need large data stream to finish decision trees induction, as show notable limitations (…

Extreme ultraviolet (EUV) lithography is essential in the advanced technology nodes. Source
mask optimization (SMO) for EUV lithography, especially the heuristic-based SMO, is one …

We propose a universal calculation formula of Fourier transform profilometry and give a
strict theoretical analysis about the phase–height mapping relation. As the request on the …

As one of the main technologies of in situ visualization, data compression plays a key role in
solving I/O bottleneck and has been intensively studied. However, existing methods take too …

Empirical mode decomposition is introduced into Fourier transform profilometry to extract
the zero spectrum included in the deformed fringe pattern without the need for capturing two …

A robust pixel-based simultaneous source and mask optimization (SMO) method is proposed.
A three dimensional (3D) partially coherent imaging model is used in this method. The …

The phase unwrapping algorithm plays a very important role in many noncontact optical
profilometries based on triangular measurement theory. Here we focus on discussing how to …