BK 7 CH 03
BK 7 CH 03
SEMICONDUCTOR
BANDSTRUCTURE
In this chapter we present gures discussing bandstructures of important semiconductors and the
concept of doping and mobile carriers.
SEMICONDUCTOR BANDSTRUCTURE
In semiconductors we are pimarily interested in the
valence band and conduction band. Moreover, for
most applications we are interested in what happens
near the top of the valence band and the bottom of
the conduction band. These states originate from the
atomic levels of the valence shell in the elements
making up the semiconductor.
IV Semiconductors
C 1s22s22p2
Si 1s22s22p63s23p2
Ge 1s22s22p63s23p63d104s24p2
III-V Semiconductors
Ga 1s22s22p63s23p63d104s24p1
As 1s22s22p63s23p63d104s24p3
X point: kx = 2π ; ky = kz = 0 Γ
a X
L point: kx = ky = kz = π
a
a = lattice constant (cube edge)
A TYPICAL BANDSTRUCTURE: Si
6
L3 Γ2
4 Γ2
L1
2 Γ15 Γ15
Γ25 Γ25
0 L Χ1
3
ENERGY (eV)
–2 Χ4
–4
–6
–8 L1
L
–10 2
Γ1 Γ1
–12
L Λ Γ ∆ Χ UK Σ Γ
DIRECT
AAA AAA
CONDUCTION
BAND
AAA
AAA AAA
AA
AAA
AA
AAA
AA
AAA
A
A
A
AA INDIRECT
AA
AAA
AAA
Direct CONDUCTION
bandgap BAND
Indirect
bandgap
∆ I
II
VALENCE I Heavy Hole Band
BAND
II Light Hole Band
III
III Split-Off Band
∆ = Split-Off Energy
k=0
k
CdS
0.2 AlAs
AlSb
( mmoc )
ZnTe GaP
*
ZnSe
CdSe
EFFECTIVE MASS
CdTe
0.1 InP
GaAs
GaSb
InAs
InSb
0
0 1.0 2.0 3.0
BANDGAP Eg (eV)
Silicon
6
Eg = 1.1eV
5
at 300K
4 kz
3 (001)
ENERGY (eV)
2 3.4
Six equivalent
1.1
(010) valleys at
1 (100)
Eg conduction
bandedge
0
–1 kx (100) (010) ky
(001)
–2
–3 4.37 x 10–4 T2
Eg = 1.17 – (eV) T = Temperature in K
–4 T – 636
k
(b)
(a)
• Indirect gap material weak optical transitions, cannot be used to produce lasers.
2π 2π
• Valleys along the x-axis and –x-axis: k0x = a (0.85,0,0) and k0x = a (–0.85,0,0):
E(k) = Ec + h
2 (kx – k0x)2
kx2 + kz2
; ml = 0.98 m0; mt = 0.19 m0
+
2 m*l m*t
similar E-k relations for other 4 valleys.
Gallium Arsenide
6
Eg = 1.43eV
CONDUCTION
5 at 300 K BAND
4
3
ENERGY (eV)
2 0.58
0.3
1 Eg 5.4 x 10–4 T2
Eg = 1.519 – (eV)
T + 204
0
T = Temperature in K
–1
–2
–3
–4
[111] [100]
k
VALENCE BAND: • Heavy hole mass: 0.45 m0; light hole mass = 0.08 m0.
Intrinsic carrier concentration at 300 = 1.84 x 106 cm–3.
ENERGY
0.3
Eg
(eV)
(eV)
1 1 2.75
Eg 0.90
0 0
–1 –1
–2 –2
–3 –3
–4 –4
(a) L [111] Γ [100]X (b) L [111] Γ [100]X
ENERGY
2 2
(eV)
0.9
(eV)
0.6
9 4
1 1 Eg
E
0 g 0
–1 –1
–2 –2
–3 –3
–4 –4
L [111] Γ [100]X L [111] Γ [100]X
(c) (d) k
k
Properties of some semiconductors. D and I stand for direct and indirect gap,
respectively. The data are at 300 K. Note that Si has six conducton band
valleys, while Ge has four.
PROPERTY SI GAAS
For Si: m*dos: To be used in calculating density of states, position of Fermi level
m*σ: To be used in calculating response to electric field, e.g., in mobility
In a filled band (valence band) no current can flow, since electrons are
normally Fermi particles and obey the Pauli exclusion principle. The
electrons can “move” if there is an empty state available. The empty
states in the valence band are called holes.
E
Conduction
band
Wavevector associated
kh with the missing electron
ke
k
Electron
removed
+ VALENCE
BAND
t2 > t1>0
t=0 t = t1 t = t2
Ε Ε Ε
Fx Fx Fx
F F F
kx kx kx
E G E G E G
D H D H D H
C I C I C I
B J B J B J
A K A K A K
e
ve je
vh
h
jh
(d)
METALS
Evac
EF
Electrons in the
ENERGY
Ec
conduction band
can carry current
(a)
SEMICONDUCTORS
Evac
Electrons in the conduction band
– – (density, n) carry current
Ec
ENERGY
For small electron (n), hole (p) densities we can use Boltzmann approximation:
m*hkBT 3/2
p=2 ( )
2πh2
exp [(Ev– EF)/kBT]
kBT 3/2
Intrinsic case: ni = pi = 2 ( )
2πh2
(m*em*h)3/4 exp (–Eg/2kBT)
1017
1016 Ge
1015
Temperature dependence of
1014 Si
ni, pi in Si, Ge, GaAs
1013
1012
11
10
10
10
109
GaAs
10 8
10 7
106
0.5 1.0 1.5 2.0 2.5 3.0 3.5 4.0
1000/T (K–1)
Si (300 K) 2.78 x 1019 cm–3 9.84 x 1018 cm–3 1.5 x 1010 cm–3
Ge (300 K) 1.04 x 1019 cm–3 6.0 x 1018 cm–3 2.33 x 1013 cm–3
GaAs (300 K) 4.45 x 1017 cm–3 7.72 x 1018 cm–3 1.84 x 106 cm–3
Effective densities and intrinsic carrier concentrations of Si, Ge and GaAs. The numbers for
intrinsic carrier densities are the accepted values even though they are smaller than the values
obtained by using the equations derived in the text.
If an impurity atom replaces a host semiconductor atom in a crystal it could donate (donor) an
extra electron to the conduction band or it could accept (acceptor) an electron from the valence
band producing a hole.
All 4 outer EC
electrons go into
the valence band
EV
Silicon
host atom
= + +
Electron-ion
Pentavalent Coulombic
donor impurity = Silicon-like + attraction
A schematic showing the approach one takes to understand donors in semiconductors. The
donor problem is treated as the host atom problem together with a Coulombic interaction term.
The silicon atom has four “free” electrons per atom. All four electrons are contributed to the
valence band at 0 K. The dopant has five electrons out of which four are contribted to the
valence band, while the fifth one can be used for increasing electrons in the conducton band.
E Conduction
band
Si Si Si
Ec
+ Excess Ed
Si As positive Donor
( )( εεso )2 eV
m*
AAAA
Ed = Ec –13.6 m o
charge level
–
Si Si Si
AAAA
Excess electron Ev Valence
AAAA
n-type
band
silicon
Arsenic (As) atom donates one
electron to the conduction band to
produce an n-type silicon
Charges associated with an arsenic impurity atom in silicon. Arsenic has five valence electrons,
but silicon has only four valence electrons. Thus four electrons on arsenic form tetrahedral
covalent bonds similar to silicon, and the fifth electron is available for conduction. The arsenic
atom is called a donor because when ionized it donates an electron to the conduction band.
TEMPERATURE (K)
500
1000 300 200 100 75 50
10 17
Si
Nd = 1015cm–3
Intrinsic range
ELECTRON DENSITY n (cm–3)
10 16
Saturation range
10 15
Freeze-out
range
14
10 ni
10 13
0 4 8 12 16 20
1000/T (K–1)
Electron density as a function of temperature for a Si sample with donor impurity
concentration of 1015 cm–3. It is preferable to operate devices in the saturation region
where the free carrier density is approximately equal to the dopant density.
It is not possible to operate devices in the intrinsic regime, since the devices always have a high
carrier density that cannot be controlled by electric fields.
every semiconductor has an upper temperature beyond which it cannot be used in devices.
The larger the bangap, the higher the upper limit.
V C Si Ge α-Sn
C 5.5i,D
Si 2.6i,Z/W 1.1i,D 0.7-1.1i
Ge 0.7-1.1 0.74i,D
α-Sn 0.09,D
i: Indirect gap
III-V N P As Sb D: Diamond
B 3.8,W 2.0i,Z 1.5i,Z Z: Zinc Blende
Al 5.9,W 2.5,Z 2.2,Z 1.7,Z
Ga 3.5,W 2.4i,Z 1.5,Z 0.81,Z W: Wurtzite
In 2.4,W 1.4,Z 0.41,Z 0.24,Z R: Rocksalt
II-VI O S Se Te O: Orthorhombic
Zn 3.4,W 3.6,Z/W 2.8,Z/W 2.4,Z Rh: Rhombohedral
Cd 1.3i,R 2.5,Z/W 1.8,Z/W 1.6,Z T: Trigonal
Hg 2.2,O/Rh 2.3,T –.06,Z –.3,Z
OR: Orthorhombic
I-VII F Cl Br I distorted rocksalt
Cu 3.4,Z 3.1,Z 3.1,Z M: Monoclinic
Ag 2.8i,R 3.2i,R 2.7i,R 3.0,W