MRAM
(Magnetoresistance Random Access Memory)
NAME- ATUL KUMAR JADON CLASS- ECE
What is MRAM?
MRAM is a nonvolatile random access memory which uses magnetic storage and magnetoresistance (MR) to read the stored data.
Magnetoresistive material is a resistor made of common ferromagnetic material which will change in resistance in the presence of a magnetic field.
The general attributes of MRAM are:
 Nonvolatility  Infinite write cycling without wearout  Fast write (few nanoseconds for advanced modes)  Low write energy  Nondestructive read.
MRAM: Writing process
Transistor is OFF
When current is passed through the write lines, an induced magnetic field is created at the junction, which alters the polarity of the free layer.
MRAM: Reading process
Transistor is ON
Measuring of electrical resistance of a small sense current from a supply line through the cell to the ground.
Magnetoresistance
This is the observable change in electrical resistivity when a magnetic field is present. Two of the most useful types of Magnetoresistance are;
Giant Magnetoresistance
Tunnel Magnetoresistance
Giant Magnetoresistance
GMR can occur between two adjacent ferromagnetic
layers separated by a spacer.
 Electrons with their spins aligned with the ferromagnetic
moment are less likely to scatter which leads to lower resistance.
 High resistivity = anti parallel alignment  Low resistivity = parallel alignment
Tunnel Magnetoresistance
 Spin of electrons is conserved in the tunneling process.  Tunneling of up- and downspin electrons are two independent processes  conductance occurs in the two independent spin channels.  Electrons originating from one spin state of the first ferromagnetic film are accepted by unfilled states of the same spin of the second film.
Other RAM Technologies
DRAM
Each bit of data is stored in a separate capacitor within an integrated circuit
Characteristics
 The highest density RAM currently available  The least expensive one Moderately fast  Volatile
Other RAM Technologies
SRAM
Each bit is stored on four transistors that form two crosscoupled inverters
Characteristics  Volatile
 Expensive  Fast  Low power consumption  Less dense than DRAM
MRAM Status
 2003 - A 128 kbit MRAM chip was introduced, manufactured with a 180 nm lithographic process  2004 - Infineon unveiled a 16-Mbit prototype, manufactured with a 180 nm lithographic process 2005 - Sony announced the first lab-produced spin-torque-transfer MRAM  2007 - Tohoku University and Hitachi developed a prototype 2 Mbit Non-Volatile RAM Chip employing spin-transfer torque switching  2008 - Scientists in Germany have developed next-generation MRAM that is said to operate with write cycles under 1 ns.  2009 - Hitachi and Tohoku University demonstrated a 32-Mbit spintransfer torque RAM (SPRAM)
REFERENCES
 www.mram-info.com/  www.nve-spintronics.com/mram-operation.php  en.wikipedia.org/wiki/Magnetoresistive_randomaccess_memory  www.sciencedaily.com/articles/m/mram.htm