JPH0280300A - Material covered with carbon film of office supplies - Google Patents
Material covered with carbon film of office suppliesInfo
- Publication number
- JPH0280300A JPH0280300A JP23316788A JP23316788A JPH0280300A JP H0280300 A JPH0280300 A JP H0280300A JP 23316788 A JP23316788 A JP 23316788A JP 23316788 A JP23316788 A JP 23316788A JP H0280300 A JPH0280300 A JP H0280300A
- Authority
- JP
- Japan
- Prior art keywords
- carbon
- film
- mainly
- diamond
- resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
Landscapes
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- Tables And Desks Characterized By Structural Shape (AREA)
- Polymerisation Methods In General (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
「発明の利用分野」
本発明は、紙、人体または衣服とこすれ得る面を持つ有
機物の事務用部材の表面を、炭素または炭素を主成分と
する保護用被膜で覆ったものである。そして耐摩耗性を
向上させ、はこりの付着を防ぎ、静電気の発生を防いだ
ものである。Detailed Description of the Invention "Field of Application of the Invention" The present invention provides a method for covering the surface of an organic office member with a surface that can rub against paper, the human body, or clothing with a protective coating containing carbon or carbon as a main component. It is something that It also improves abrasion resistance, prevents the adhesion of lumps, and prevents the generation of static electricity.
本発明はかかる薄膜として、可視領域で透光性を有する
とともに、硬度が十分な炭素または炭素を主成分とする
被膜を摩耗防止用保護膜としたものである。特にこの保
護膜は、有機物上に密着させ得るとともに、その電気的
固有抵抗としてl×10’〜5 XIO”ΩcI11を
有せしめて、静電気の発生を防ぐ、とともに、表面に平
滑性を有せしめ、はこりの付着を防がんとしたものであ
る。In the present invention, such a thin film is made of carbon or a coating mainly composed of carbon, which is transparent in the visible region and has sufficient hardness, as a wear-preventing protective film. In particular, this protective film can be closely attached to an organic material, has an electrical resistivity of 1×10' to 5 XIO"ΩcI11, prevents the generation of static electricity, and has a smooth surface. It prevents the adhesion of lumps and cancer.
本発明は、かかるフロントガラス、サイドガラス、リア
ウィンド等の窓にプラズマCVD法で炭素膜または炭素
を主成分とする被膜を形成せんとしたものである。The present invention aims to form a carbon film or a film containing carbon as a main component on windows such as windshields, side glasses, rear windows, etc. by plasma CVD.
「従来技術」
一般にプラズマCVD法においては、平坦面を有する導
電性基板上に平面状に成膜する方法が工業的に有効であ
るとされている。さらに、プラズマCVD法でありなが
ら、スパッタ効果を伴わせつつ成膜させる方法も知られ
ている。その代表例である炭素膜のコーティングに関し
ては、本発明人の出願になる特許願r炭素被膜を有する
複合体およびその作製方法1 (特願昭56−1469
36 昭和56年9月17日出願)が知られている。"Prior Art" Generally, in the plasma CVD method, a method of forming a film in a planar shape on a conductive substrate having a flat surface is considered to be industrially effective. Furthermore, a method is also known in which a film is formed using a plasma CVD method while also producing a sputtering effect. Regarding the carbon film coating, which is a typical example, the patent application filed by the present inventor is entitled "Composite having a carbon film and its manufacturing method 1" (Japanese Patent Application No. 56-1469).
36 (filed on September 17, 1982) is known.
しかし、これらは一対の電極のみを用いる平行平板型の
一方の電極(カソード側)に基板を配設し、導体基板で
あるため、自ら発生するセルフバイアスを用いて平坦面
の上面に炭素膜を成膜する方法である。However, since these are conductive substrates with a substrate placed on one electrode (cathode side) of a parallel plate type using only a pair of electrodes, a carbon film is formed on the top surface of the flat surface using self-generated self-bias. This is a method of forming a film.
「従来の問題点」
しかし、かかるスパッタ効果を伴わせつつ成膜させる従
来例は、絶縁材料の事務用部材上に膜を作ることができ
ない。本発明はかかる目的のためになされたものである
。"Problems with the Conventional Method" However, in the conventional method of forming a film while producing the sputtering effect, it is not possible to form a film on an office member made of an insulating material. The present invention has been made for this purpose.
「問題を解決すべき手段」
本発明は、摩擦を伴う事務用部材、特に紙、人体、衣服
等とこすれることにより、傷が着きやすく、またはほこ
りが付着しゃすい透光性を有する有機物の表面を有する
部材上に、保護膜として、炭素または炭素を主成分とす
る被膜を設けたものである。この被膜に固有抵抗として
lXl0’〜5XIO”Ωcmを有せしめ、はこり(一
般に絶縁性または鉱物性)を伴う摩擦による静電気の発
生を防ぎ、ひいてはほこりの付着、はこりによる透光性
表面の微小傷の発生による失透または「にごり」を防ぎ
、常に鮮やかな透光性の面を保存せしめたものである。``Means to Solve the Problem'' The present invention is directed to the surface of a translucent organic material that is easily scratched or dust-adhered by rubbing against office materials that involve friction, especially paper, the human body, clothing, etc. Carbon or a film containing carbon as a main component is provided as a protective film on a member having carbon. This coating has a specific resistance of 1X10' to 5XIO'' Ωcm, which prevents the generation of static electricity due to friction with chips (generally insulating or mineral), and also prevents dust from adhering to the surface of the light-transmitting surface due to chips. This prevents devitrification or "cloudiness" caused by scratches, and maintains a bright translucent surface at all times.
本発明は、かかる目的の保護膜として、固有抵抗がピン
カース硬度として600〜6000Kg/cm”の値を
有す、るプラズマ重合またはCVD法による炭素または
炭素を主成分とする膜を有機物上に密着せしめ得ること
の発見に基づく。The present invention provides, as a protective film for such purpose, a carbon or carbon-based film formed by plasma polymerization or CVD, which has a specific resistance of 600 to 6,000 Kg/cm" in terms of Pinkers hardness, and is adhered to the organic substance. Based on the discovery of what can be done.
この薄膜の形成として、SP3軌道を有するダイヤモン
ドと類似のC−〇結合をつくり、比抵抗(固有抵抗)l
×10h〜5×101!Ωcam、代表的には1×10
7〜5X10”ΩcI11を有するとともに、光学的エ
ネルギバンド巾(IEgという)が1.OeV以上、好
ましくは1.5〜5.5eVを有する可視領域で透光性
のダイヤモンドと類似の特性を有する炭素膜または炭素
を主成分(副成分の主たるものは水素、弗素、窒素であ
る)とする被膜を形成した。To form this thin film, a C-0 bond similar to that of diamond with an SP3 orbital is created, and the resistivity (specific resistance) l
×10h~5×101! Ωcam, typically 1×10
Carbon having properties similar to those of diamond, which is transparent in the visible region and has an optical energy band width (referred to as IEg) of 1.0eV or more, preferably 1.5 to 5.5eV. A film or a film containing carbon as the main component (the main subcomponents are hydrogen, fluorine, and nitrogen) was formed.
本発明を用いた透光性有機物は、固有抵抗1×1015
Ωcm以上の絶縁性部材であり、材料は、ポリエステル
樹脂、アルキド樹脂、オイルフリーアルキド樹脂、不飽
和ポリエステル樹脂、アクリル樹脂、アミノ樹脂が用い
られる。特に自動車ライン用にはアクリルラッカー、ア
クリルメラミン、ブロックアクリルウレタンの有機溶融
型の有機物とした。The translucent organic substance used in the present invention has a specific resistance of 1×1015
It is an insulating member of Ωcm or more, and the material used is polyester resin, alkyd resin, oil-free alkyd resin, unsaturated polyester resin, acrylic resin, or amino resin. In particular, for automobile lines, organic melting type organic materials such as acrylic lacquer, acrylic melamine, and block acrylic urethane were used.
本発明方法での成膜に際し、弗素の如きハロゲン元素と
窒素とを、プラズマCVD中に炭化物気体に加えて同時
に混入させて、厚さ方向に均一な濃度勾配を設けた炭素
を主成分とする被膜または添加物の有無を制御した多層
の複合膜を作ってもよい。When forming a film using the method of the present invention, a halogen element such as fluorine and nitrogen are mixed simultaneously with carbide gas during plasma CVD to create a film with a uniform concentration gradient in the thickness direction, and the main component is carbon. Multilayer composite membranes may be created with controlled presence or absence of coatings or additives.
以下に図面に従って本発明の作製方法を記す。The manufacturing method of the present invention will be described below according to the drawings.
「実施例1」
第2図は、下敷き等の事務用部材上に薄膜形成方法を実
施するためのプラズマCVD装置の概要を示す。"Example 1" FIG. 2 shows an outline of a plasma CVD apparatus for carrying out a method of forming a thin film on office materials such as underlays.
図面において、プラズマCVD装置の反応容器(7)は
ゲート弁(9)で外部と仕切られている。ガス系(30
)において、キャリアガスであるアルゴンを(31)よ
り、反応性気体である炭化水素気体、例えばメタン、エ
チレンを(32)より、添加物気体である弗化炭素(C
2F4.C3FI)を(33)より、反応容器のエツチ
ング用気体である酸素を(34)より、パルプ(28)
、流量計(29)をへて反応系(50)中にノズル(2
5)より導入する。iチレンと二弗化炭素とを導入する
と、水素と、弗素が添加されたsp’結合を多数有する
ダイヤモンド状炭素膜(DLCともいうが、添加物が添
加されたDLCを含めて本発明は炭素または炭素を主成
分とする被膜という)を成膜できる。In the drawing, a reaction vessel (7) of the plasma CVD apparatus is separated from the outside by a gate valve (9). Gas type (30
), the carrier gas argon is added from (31), the reactive gas hydrocarbon gas such as methane or ethylene is added from (32), and the additive gas fluorocarbon (C
2F4. C3FI) from (33), oxygen, which is the etching gas in the reaction vessel, from (34), and pulp (28).
, the nozzle (2) passes through the flow meter (29) and enters the reaction system (50).
5) Introduce more. When i-tyrene and carbon difluoride are introduced, hydrogen and a diamond-like carbon film (also referred to as DLC, which includes DLC to which additives are added) have many sp' bonds. or a film whose main component is carbon) can be formed.
これと同一主成分の被膜を作るため、CzFa、CJs
を(32)より、またNHsを(33)より導入して形
成してもよい。In order to make a film with the same main components as this, CzFa, CJs
may be formed by introducing from (32) or NHs from (33).
この反応容器(7)の上下に第1の一対の電極を同一形
状を有せしめて第1および第2の電1(3−1)。A first pair of electrodes having the same shape are provided above and below this reaction container (7) to form first and second electrodes 1 (3-1).
(3−2)をアルミニウムの金属メツシュで構成せしめ
る0反応性気体はノズル(25)より下方向に放出され
る。さらに第2の一対の電極である第3の電極(13−
1) 、 (13−2) 、・・・(13−n )と他
の第4の電極(13°−1) 、 (13’−2)
・・・(13’ −n) (それぞれを集合させて第3
および第4の電極という)を部材を互いにはさみこみ配
置とする。部材(1−) 、 (1−2)・・・(1−
n)は絶縁材料であるが、ここに第2の交番電圧を加え
、交流的には実質的に導体化してバイアスを印加した。The zero-reactive gas that makes (3-2) consist of an aluminum metal mesh is discharged downward from the nozzle (25). Further, a third electrode (13-
1), (13-2), ... (13-n) and the other fourth electrode (13°-1), (13'-2)
...(13' -n) (Collect each to form the third
and a fourth electrode) are sandwiched between the members. Member (1-), (1-2)...(1-
n) is an insulating material, and a second alternating voltage was applied thereto to make it substantially conductive in terms of alternating current, and a bias was applied thereto.
部材(1)上の有機物の被形成面(1゛)には、プラズ
マ雰囲気またはポジティブシスができ、負の自己バイア
スが印加される。この負の自己バイアスが積極的に発生
するよう、第2の交番電圧の周波数を10Hz〜100
KHzとイオンが第3と第4の電極間を半周期(半サイ
クル)の間にゆきわたるように低い周波数とした。部材
(1)は有機物の被形成面(1゛)を有し、第1の高周
波の交番電圧によりグロー放電のプラズマ化した反応性
気体は、反応空間(8)で均一に分散し、反応空間での
プラズマ電位を均質にした。A plasma atmosphere or positive cis is created on the surface (1') on which the organic substance is formed on the member (1), and a negative self-bias is applied. In order to actively generate this negative self-bias, the frequency of the second alternating voltage is set to 10Hz to 100Hz.
KHz and a low frequency such that the ions spread between the third and fourth electrodes during a half cycle. The member (1) has a surface (1゛) on which an organic substance is formed, and the reactive gas that has been turned into plasma by the glow discharge due to the first high-frequency alternating voltage is uniformly dispersed in the reaction space (8). The plasma potential at was made homogeneous.
さらにプラズマ反応空間での電位分布をより等しくさせ
るため、電源系(40)には独立した二種類の周波数の
交番電圧が印加できるようになっている。第1の交番電
圧は1〜100MHz例えば13.56MHzの高周波
であり、一対をなす2つの電源(15−1)。Furthermore, in order to make the potential distribution in the plasma reaction space more equal, alternating voltages of two independent frequencies can be applied to the power supply system (40). The first alternating voltage is a high frequency of 1 to 100 MHz, for example 13.56 MHz, and the two power supplies (15-1) form a pair.
(15−2)即ち(15)よりLCR回路でできたマツ
チングボックス(16−1) 、 (16−2)に至る
。このマツチングボックスでの互いの位相は位相調整器
(26)により調整し、互いに180 ’または0°ず
れて供給できるようにしている。そして対称型または同
相型の出力を有し、電源(15−1) 、 (15−2
)のそれぞれの−端(4−1) 、 (4−2)は一対
の第1および第2の電極(3−1) 、 (3−2)に
それぞれ連結されている。また、それぞれの電源(15
−1) 、 (15−2)の他端は接地(5−1) 。(15-2) That is, (15) leads to matching boxes (16-1) and (16-2) made of LCR circuits. The mutual phases in this matching box are adjusted by a phase adjuster (26), so that the signals can be supplied with a difference of 180' or 0° from each other. It has a symmetrical or in-phase output, and the power supply (15-1), (15-2
) are connected to a pair of first and second electrodes (3-1) and (3-2), respectively. Also, each power supply (15
-1), the other end of (15-2) is grounded (5-1).
(5−2)されている。第2の1O11z=100KH
z例えば5011zの交番電圧が電源(17)即ち(1
7−1) 、 (17−2)より一対の第3の電極(1
3−1)、 ・・・(13−n)および第4の電極(
13’−1) ・・・(13”−n)に連結されてお
り、印加されている。その一対の電極(13) 、 (
13”)での出力はこの一対の電極にはさまれた部材(
1)に自己バイアスがかかるようになされている。(5-2) Yes. Second 1O11z=100KH
For example, the alternating voltage of 5011z is the power supply (17), that is, (1
7-1), a pair of third electrodes (1
3-1), ... (13-n) and the fourth electrode (
13'-1) ... (13"-n) and is applied with voltage. The pair of electrodes (13), (
13”), the output from the member sandwiched between this pair of electrodes (
1) is made to have a self-bias.
かくして反応空間にプラズマ(8)が発生する。Plasma (8) is thus generated in the reaction space.
排気系(25)は、圧力調整パルプ(21)、ターボ分
子ポンプ(22)、ロータリーポンプ(23)を経て不
要気体を排気する。The exhaust system (25) exhausts unnecessary gas through a pressure regulating pulp (21), a turbo molecular pump (22), and a rotary pump (23).
これらの反応性気体は、反応空間(60)で0.001
〜1.0torr例えば0.05torrとした。These reactive gases are present in the reaction space (60) at 0.001
~1.0 torr, for example, 0.05 torr.
かかる空間において、13.56MHzの周波数の0.
5〜5に−(単位面積あたり0.03〜誇/cm”)例
えばIKW(単位面積あたり0.6W/cm”の高エネ
ルギ)の第1の高周波電圧を加える。さらに第2の交番
電圧による交流バイアスの印加により、被形成面上には
200〜−600V(例えばその出力はIKW)の負の
自己バイアス電圧が印加されており、この負の自己バイ
アス電圧により加速された反応性気体を部材上にスパッ
タしつつ成膜し、かつ緻密な膜とすることができた。In such a space, the frequency of 13.56 MHz is 0.
A first high frequency voltage of -(0.03 to 0.6 W/cm" per unit area), for example, IKW (high energy of 0.6 W/cm" per unit area) is applied to 5 to 5. Further, by applying an AC bias using a second alternating voltage, a negative self-bias voltage of 200 to -600V (for example, the output is IKW) is applied to the surface to be formed, and this negative self-bias voltage accelerates the process. The resulting reactive gas was sputtered onto the member to form a film, and it was possible to form a dense film.
反応性気体は、例えばエチレンと弗化炭素の混合気体と
した。その割合はCzFb/CJa =1/4〜4/1
とし、代表的には1/1である。この割合を可変するこ
とにより、透過率および比抵抗を制御することができる
0部材(1)の温度は〜150°C1代表的には外部加
熱をすることなく室温に保持させる。The reactive gas was, for example, a mixed gas of ethylene and carbon fluoride. The ratio is CzFb/CJa = 1/4 to 4/1
It is typically 1/1. By varying this ratio, the transmittance and resistivity can be controlled. The temperature of the member (1) is ~150° C. Typically, the temperature is maintained at room temperature without external heating.
かくして、被形成面上は比抵抗lXl0’〜5×101
2Ωcmを有し、有機樹脂上にも密着させて成膜させる
。可視光に対し、透光性のアモルファス構造または結晶
構造を有する弗素と水素とが添加された炭素または炭素
を主成分とする被膜を0.1〜8μm例えば0.5μm
(平面部)、1〜3μm(凸部)に生成させた。成膜速
度は100〜1000人/分を有していた。Thus, the resistivity on the surface to be formed is 1Xl0'~5×101
It has a resistance of 2 Ωcm and is formed into a film in close contact with the organic resin. A film containing carbon or carbon as a main component to which fluorine and hydrogen are added, which has an amorphous or crystalline structure that is transparent to visible light, has a thickness of 0.1 to 8 μm, for example, 0.5 μm.
(flat portion) and 1 to 3 μm (convex portion). The deposition rate was 100-1000 people/min.
かくルて部材である下敷き、その他の部材上に炭素を主
成分とする被膜、特に炭素中に水素を30原子%以下含
有するとともに、0.3〜10原子χ弗素が混入した炭
素を形成させることができた。有機物上に100〜20
00人の厚さにエチレンのみによる第1の炭素を設け、
さらにその上に弗素と水素とが添加された炭素を主成分
とする被膜をも多層に形成させることができた。In this way, a film containing carbon as a main component is formed on the underlay and other members, especially carbon containing 30 atomic percent or less of hydrogen and 0.3 to 10 atoms of chi-fluorine mixed therein. I was able to do that. 100-20 on organic matter
Provide a first carbon with only ethylene to a thickness of 0.00 people,
Furthermore, it was possible to form a multi-layered film containing carbon as a main component to which fluorine and hydrogen were added.
「実施例2」
この実施例は実施例1で用いた装置により、第1図に示
す如く、透光性有機物の部材要部上に炭素を主成分とす
る膜を作製した例である。"Example 2" This example is an example in which a film containing carbon as a main component was produced on the main part of a translucent organic material as shown in FIG. 1 using the apparatus used in Example 1.
第1図(八)において、事務用品(事務用部材)である
上記を示す。その縦断面部を第1図(B)に示す。In FIG. 1 (8), the above-mentioned office supplies (office members) are shown. A longitudinal section thereof is shown in FIG. 1(B).
第1図(A) 、 (B)において、この透光性プラス
チックス(1)は軽量であり、例えばアクリル樹脂で設
けられている。その被形成面を有する部材(1)上に炭
素または炭素を主成分とする耐摩耗性の保護膜(45)
を0.1〜8μmの厚さに設けた。In FIGS. 1A and 1B, the translucent plastic (1) is lightweight and is made of, for example, acrylic resin. A wear-resistant protective film (45) made of carbon or carbon as a main component on the member (1) having the surface on which it is formed.
was provided with a thickness of 0.1 to 8 μm.
本発明において、特にこの炭素または弗素が添加された
炭素を主成分とする被膜は静電気の発生によるゴミの付
着を防ぐため、その比抵抗は1×106〜5×10′2
Ωcmの範囲、特に好ましくは1×107〜lxlOI
IQcmの範囲とした。In the present invention, in order to prevent the adhesion of dust due to the generation of static electricity, the coating mainly composed of carbon or fluorine-added carbon has a specific resistance of 1 x 106 to 5 x 10'2.
in the range of Ωcm, particularly preferably from 1 x 107 to lxlOI
The range was set as IQcm.
第1図(C)は三角定規でありA−A”の縦断面図を(
D)に示す。この定規の上表面に炭素または炭素を主成
分とする被膜(45)を0.5μmの厚さに実施例1に
従って形成した。紙、人体、衣服等との摩擦が多く、ま
た鉱物質のほこりがこずれやす(、結果として失透、濁
りが摩耗により発生しやすいため、本発明は優れたもの
である。Figure 1 (C) is a triangular ruler, and the vertical cross-sectional view of A-A'' is (
Shown in D). A coating (45) of carbon or containing carbon as a main component was formed on the upper surface of this ruler to a thickness of 0.5 μm according to Example 1. The present invention is excellent because there is a lot of friction with paper, the human body, clothing, etc., and mineral dust tends to get stuck (as a result, devitrification and turbidity are likely to occur due to wear).
「効果」
本発明は、特にその上面を水はけのよい弗素が添加され
たピンカース硬度600〜3000Kg/cm”の炭素
を主成分とする被膜、またはビッカース硬度が1000
〜7000Kg/cm2の炭素(水素も添加されている
)の多層膜を有機物上に密着させてコートした。その結
果、祇、人体、衣服によりこすれやすい凸部により厚く
耐摩耗性膜として形成することができた。"Effects" The present invention is particularly suitable for coating the upper surface with a carbon-based coating having a Pinkers hardness of 600 to 3,000 Kg/cm and having a fluorine-added coating that has good drainage or a Vickers hardness of 1,000 Kg/cm.
A multilayer film of ~7000 Kg/cm2 of carbon (hydrogen was also added) was closely coated on the organic material. As a result, it was possible to form a thick, wear-resistant film on the convex parts that are easily rubbed by the body, the human body, and clothing.
以上に示す如く、これまで柔らかいためまったく使えな
かったプラスチック製ウィンドを作ることの可能性を実
現したことで有効である。As shown above, this invention is effective because it realizes the possibility of making plastic windows, which until now were completely unusable due to their softness.
以上の説明より明らかな如く、本発明は有機樹脂または
これらの多層膜をコーティングして設けたものに特に有
効である。この複合体は、他の多くの実施例にみられる
如く、その応用ははかりしれないものであり、特にこの
炭素が150°C以下の低温で形成でき、このため下地
の塗装面の有機物の変成による色調も変わらず、その硬
度また基体または部材に対する密着性がきわめて優れて
いるのが特徴である。As is clear from the above description, the present invention is particularly effective for materials coated with organic resins or multilayer films thereof. The applications of this composite, as seen in many other examples, are enormous, especially since the carbon can be formed at low temperatures below 150°C, and therefore it is difficult to transform the organic matter of the underlying painted surface. The color tone remains the same, and its hardness and adhesion to substrates or members are extremely excellent.
第1図は本発明の事務用部材上への炭素膜または炭素を
主成分とした保護膜をコートした例およびその要部を示
す。
第2図は本発明のプラズマCVD装置の製造装置の概要
を示す。FIG. 1 shows an example in which a carbon film or a protective film mainly composed of carbon is coated on an office member according to the present invention, and its essential parts. FIG. 2 shows an outline of a manufacturing apparatus for a plasma CVD apparatus according to the present invention.
Claims (1)
であって、前記有機物表面に1×10^6〜5×10^
1^2Ωcmの固有抵抗を有しかつ透光性を有する炭素
または炭素を主成分とする膜が設けられたことを特徴と
する炭素膜で覆われた事務用部材。 2、特許請求の範囲第1項において、事務用部材は定規
、三角定規、下敷き、事務机上面よりなることを特徴と
する炭素膜で覆われた事務用部材。[Scope of Claims] 1. An organic member having a surface that can rub against paper, the human body, or clothing, the organic material having a surface of 1×10^6 to 5×10^
An office member covered with a carbon film, characterized by being provided with carbon or a film mainly composed of carbon, which has a specific resistance of 1^2 Ωcm and is translucent. 2. An office member covered with a carbon film according to claim 1, characterized in that the office member comprises a ruler, a triangular ruler, an underlay, and the top surface of an office desk.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23316788A JP2627939B2 (en) | 1988-09-16 | 1988-09-16 | Office materials covered with carbon film |
| US07/403,821 US5041201A (en) | 1988-09-16 | 1989-09-07 | Plasma processing method and apparatus |
| KR1019890013120A KR920007022B1 (en) | 1988-09-16 | 1989-09-11 | Plasma treatment method and apparatus |
| EP89309352A EP0359567B1 (en) | 1988-09-16 | 1989-09-14 | Plasma processing method and apparatus |
| DE68917550T DE68917550T2 (en) | 1988-09-16 | 1989-09-14 | Method and device for plasma treatment. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23316788A JP2627939B2 (en) | 1988-09-16 | 1988-09-16 | Office materials covered with carbon film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0280300A true JPH0280300A (en) | 1990-03-20 |
| JP2627939B2 JP2627939B2 (en) | 1997-07-09 |
Family
ID=16950772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23316788A Expired - Lifetime JP2627939B2 (en) | 1988-09-16 | 1988-09-16 | Office materials covered with carbon film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2627939B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6579833B1 (en) | 1999-09-01 | 2003-06-17 | The Board Of Trustees Of The University Of Illinois | Process for converting a metal carbide to carbon by etching in halogens |
| US7241475B2 (en) * | 2004-09-30 | 2007-07-10 | The Aerospace Corporation | Method for producing carbon surface films by plasma exposure of a carbide compound |
-
1988
- 1988-09-16 JP JP23316788A patent/JP2627939B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6579833B1 (en) | 1999-09-01 | 2003-06-17 | The Board Of Trustees Of The University Of Illinois | Process for converting a metal carbide to carbon by etching in halogens |
| US7241475B2 (en) * | 2004-09-30 | 2007-07-10 | The Aerospace Corporation | Method for producing carbon surface films by plasma exposure of a carbide compound |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2627939B2 (en) | 1997-07-09 |
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