User profiles for Philippe Leray
Philippe LERAYProfesseur, Nantes Université Verified email at univ-nantes.fr Cited by 2361 |
Feature selection with neural networks
P Leray, P Gallinari - Behaviormetrika, 1999 - Springer
The observed features of a given phenomenon are not all equally informative: some may be
noisy, others correlated or irrelevant. The purpose of feature selection is to select a set of …
noisy, others correlated or irrelevant. The purpose of feature selection is to select a set of …
[PDF][PDF] BNT structure learning package: Documentation and experiments
P Leray, O Francois - Laboratoire PSI, Universitè et INSA de Rouen, Tech …, 2004 - Citeseer
Bayesian networks are a formalism for probabilistic reasonning that is more and more used
for classification task in data-mining. In some situations, the network structure is given by an …
for classification task in data-mining. In some situations, the network structure is given by an …
A survey on latent tree models and applications
In data analysis, latent variables play a central role because they help provide powerful insights
into a wide variety of phenomena, ranging from biological to human sciences. The latent …
into a wide variety of phenomena, ranging from biological to human sciences. The latent …
Deep learning-based defect classification and detection in SEM images
…, S Halder, K Khalil, P Leray… - Metrology …, 2022 - spiedigitallibrary.org
Defect inspection in semiconductor processes has become a challenging task due to
continuous shrink of device patterns (pitches less than 32 nm) as we move from node to node. …
continuous shrink of device patterns (pitches less than 32 nm) as we move from node to node. …
28nm pitch single exposure patterning readiness by metal oxide resist on 0.33 NA EUV lithography
…, QT Le, F Schleicher, P Leray… - Extreme Ultraviolet …, 2021 - spiedigitallibrary.org
For many years traditional 193i lithography has been extended to the next technology node
by means of multi-patterning techniques. However recently such a 193i technology became …
by means of multi-patterning techniques. However recently such a 193i technology became …
Learning causal bayesian networks from observations and experiments: A decision theoretic approach
We discuss a decision theoretic approach to learn causal Bayesian networks from
observational data and experiments. We use the information of observational data to learn a …
observational data and experiments. We use the information of observational data to learn a …
SEM image denoising with unsupervised machine learning for better defect inspection and metrology
…, K Khalil, G Lorusso, J Severi, P Leray… - … Process Control for …, 2021 - spiedigitallibrary.org
CD-SEM images inherently contain a significant level of noise. This is because a limited
number of frames are used for averaging, which is critical to ensure throughput and minimize …
number of frames are used for averaging, which is critical to ensure throughput and minimize …
On product overlay metrology challenges in advanced nodes
A Shchegrov, P Leray, Y Paskover… - … Process Control for …, 2020 - spiedigitallibrary.org
On product overlay (OPO) challenges are quickly becoming yield limiters for the latest
technology nodes, requiring new and innovative metrology solutions. In this paper we will cover …
technology nodes, requiring new and innovative metrology solutions. In this paper we will cover …
A dynamic Bayesian network to represent discrete duration models
Originally devoted to specific applications such as biology, medicine and demography, duration
models are now widely used in economy, finance or reliability. Recent works in various …
models are now widely used in economy, finance or reliability. Recent works in various …
Metrology of thin resist for high NA EUVL
…, M Ikota, AL Charley, P Leray - Metrology …, 2022 - spiedigitallibrary.org
One of the many constrains of High Numerical Aperture Extreme Ultraviolet Lithography (High
NA EUVL) is related to resist thickness. In fact, one of the consequences of moving from …
NA EUVL) is related to resist thickness. In fact, one of the consequences of moving from …